Inventor
Christopher Nam Lee
Inventor
Austin, TX, US
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1042%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
H01LSemiconductor devices17%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1017%
PatentTitleYear
9,703,200'Photolithographic methods'20179,482,945'Photoresist compositions and methods of forming photolithographic patterns'20169,418,848'Methods of forming patterns with a mask formed utilizing a brush layer'20169,184,058'Methods of forming patterns by using a brush layer and masks'20159,158,198'Photoresist compositions and methods of forming photolithographic patterns'2015Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2015–2017Patents assigned to ROHM & HAAS ELECT MAT (5)· patent assignee history
2015–2016Patents assigned to DOW GLOBAL TECHNOLOGIES LLC (2)· patent assignee history
2015–2016Patents assigned to MICRON TECHNOLOGY INC (2)· patent assignee history
2015–2017Based in Austin, TX, US· patent location history
2015Based in Concord, MA, US· patent location history
2016Based in Marlborough, MA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ROHM & HAAS ELECT MAT | 5 | 2015–2017 |
| DOW GLOBAL TECHNOLOGIES LLC | 2 | 2015–2016 |
| MICRON TECHNOLOGY INC | 2 | 2015–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Austin, Texas, US | 3 | 2015–2017 |
| Marlborough, Massachusetts, US | 1 | 2016 |
| Concord, Massachusetts, US | 1 | 2015 |