Inventor
Chu-Ming Ma
Inventor
Kaohsiung, TW
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices30%
H01LSemiconductor devices20%
H10BElectronic memory devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1010%
PatentTitleYear
10,290,728Semiconductor device and manufacturing method thereof20199,391,177'Method of fabricating semiconductor structure'20168,450,180'Methods of forming semiconductor trench and forming dual trenches, and structure for isolating devices'20138,338,250'Process for fabricating memory device'2012Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2012–2013Patents assigned to MACRONIX INT CO LTD (2)· patent assignee history
2012–2013Patents assigned to Ma chu-ming (2)· patent assignee history
2012Patents assigned to LUO TIAN-SHUAN (1)· patent assignee history
2012–2013Based in Hsinchu, TW· patent location history
2013Patents assigned to WU TIN-WEI (1)· patent assignee history
2016–2019Patents assigned to UNITED MICROELECTRONICS CORP (2)· patent assignee history
2016–2019Based in Kaohsiung, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MACRONIX INT CO LTD | 2 | 2012–2013 |
| Ma chu-mingself | 2 | 2012–2013 |
| UNITED MICROELECTRONICS CORP | 2 | 2016–2019 |
| LUO TIAN-SHUAN | 1 | 2012 |
| WU TIN-WEI | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kaohsiung, TW | 2 | 2016–2019 |
| Hsinchu, TW | 2 | 2012–2013 |