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Inventor

Tsann-Bim Chiou

Inventor
Hsinchu, TW

Overview

3→
Patents
2015–2019
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices75%
G06FElectric digital data processing25%
PatentTitleYear
10,416,566Optimization of source and bandwidth for new and existing patterning devices20199,563,135'Process tuning with polarization'20178,945,800'Method of preparing a pattern, method of forming a mask set, device manufacturing method and computer program'2015

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2015–2019Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history
2015–2019Based in Hsinchu, TW· patent location history
2017Patents assigned to CHIOU TSANN-BIM (1)· patent assignee history
2017Patents assigned to HANSEN STEVEN GEORGE (1)· patent assignee history
2017Patents assigned to MULDER HEINE MELLE (1)· patent assignee history
2019Patents assigned to Cymer LLC (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV32015–2019
CHIOU TSANN-BIMself12017
Cymer LLC12019
HANSEN STEVEN GEORGE12017
MULDER HEINE MELLE12017
Locations
LocationPatentsSpan
Hsinchu, TW32015–2019