Inventor
Tomonari Sunamichi
Inventor
Kawasaki, JP
Overview
Patents· 1 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C08Fprimary
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds25%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
H01LSemiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
PatentTitleYear
9,696,625'Method of forming resist pattern'2017Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2017Patents assigned to TOKYO OHKA KOGYO CO LTD (1)· patent assignee history
2017Based in Kawasaki, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO OHKA KOGYO CO LTD | 1 | 2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kawasaki, JP | 1 | 2017 |