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Inventor

Huang-Lin Chao

Inventor
Hillsboro, OR, US

Overview

3→
Patents
2020
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Lprimary
H01LSemiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
H10DInorganic electric semiconductor devices17%
C09GPolishing compositions8%
C09KMaterials for miscellaneous applications, not provided for elsewhere8%
C23FNon-mechanical removal of metallic material from surface8%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
PatentTitleYear
10,755,984Replacement channel etch for high quality interface202010,727,076Slurry and manufacturing semiconductor using the slurry202010,714,395Fin isolation structure for FinFET and method of forming the same2020

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2020Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (2)· patent assignee history
2020Patents assigned to INTEL CORP (1)· patent assignee history
2020Based in Hillsboro, OR, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG CO LTD22020
INTEL CORP12020
Locations
LocationPatentsSpan
Hillsboro, OR, US32020