Inventor
Junji Shimada
Inventor
Tokyo, JP
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H04Nprimary
H04NPictorial communication, e.g. television29%
C07CAcyclic or carbocyclic compounds14%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices14%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them11%
G06TImage data processing or generation, in general11%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds6%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds3%
C09DCoating compositions, e.g. paints, varnishes or lacquers3%
G06KGraphical data reading3%
G06NComputing arrangements based on specific computational models3%
PatentTitleYear
10,708,501Prominent region detection in scenes from sequence of image frames202010,705,408Electronic device to autofocus on objects of interest within field-of-view of electronic device202010,536,622Camera depth prediction using generative adversarial network202010,055,852Image processing system and method for detection of objects in motion20189,953,431Image processing system and method for detection of objects in motion20189,942,476Image capturing apparatus and image capturing method20189,426,353'Auto focus control of image capturing apparatus'20168,917,313'Image capturing apparatus and image capturing method'20148,723,918'Image capturing apparatus and image capturing method'20148,665,344'Device and method for image processing'20148,138,258'Clear coating composition for an automobile and method of forming a multi-layer coating film using the same'20127,872,671'Image pickup apparatus and image pickup method'20116,033,828'Partially hydrogenated polymers and chemically amplified positive resist compositions'20005,847,218'Sulfonium salts and chemically amplified positive resist compositions'19985,705,702'Method for preparing triarylsulfonium salts'19985,691,112'Sulfonium salt and chemically amplified positive resist composition'19975,633,409'Tristertbutoxyphenyl sulfonium tosylate compound'19975,569,784'Sulfonium salt and resist composition'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996–2000Patents assigned to SHINETSU CHEMICAL CO (6)· patent assignee history
1996–1998Based in Niigata, JP· patent location history
1997–2000Based in Nishikamo-gun, JP· patent location history
2011–2020Patents assigned to SONY CORP (11)· patent assignee history
2012–2018Patents assigned to SHIMADA JUNJI (4)· patent assignee history
2012Patents assigned to KATO MIREI (1)· patent assignee history
2012Patents assigned to NARITA YOSHINORI (1)· patent assignee history
2012Based in Neyagawa, JP· patent location history
2014–2018Based in Tokyo, JP· patent location history
2020Based in San Jose, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SONY CORP | 11 | 2011–2020 |
| SHINETSU CHEMICAL CO | 6 | 1996–2000 |
| SHIMADA JUNJIself | 4 | 2012–2018 |
| KATO MIREI | 1 | 2012 |
| NARITA YOSHINORI | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 7 | 2014–2018 |
| San Jose, California, US | 3 | 2020 |
| Nishikamo-gun, JP | 3 | 1997–2000 |
| Niigata, JP | 3 | 1996–1998 |
| Neyagawa, JP | 1 | 2012 |