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Inventor

Stijn Boschker

Inventor
Pijnacker, NL

Overview

3→
Patents
2011–2012
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices60%
F16FSprings40%
PatentTitleYear
8,245,824'Combination of structure and an active damping system, and a lithographic apparatus'20128,164,737'Lithographic apparatus having an active damping subassembly'20128,059,259'Damping arrangement, active damping system, lithographic apparatus, and projection assembly'2011

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2011–2012Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history
2011–2012Patents assigned to BOSCHKER STIJN (3)· patent assignee history
2011–2012Patents assigned to BUTLER HANS (3)· patent assignee history
2011–2012Patents assigned to DE HOON CORNELIUS ADRIANUS LAMBERTUS (3)· patent assignee history
2011–2012Patents assigned to DE PEE JOOST (3)· patent assignee history
2011–2012Based in Pijnacker, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV32011–2012
BOSCHKER STIJNself32011–2012
BUTLER HANS32011–2012
DE HOON CORNELIUS ADRIANUS LAMBERTUS32011–2012
DE PEE JOOST32011–2012
Locations
LocationPatentsSpan
Pijnacker, NL32011–2012