Inventor

Hisashi Sakai

Inventor
Numazu, JP

Overview

18→
Patents
1979–2020
Patent span
Performing operations
Primary field (CPC B)

Patents· 18 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B41Mprimary
B41MPrinting, duplicating, marking, or copying processes15%
G01NInvestigating or analysing materials by determining their chemical or physical properties11%
Y10TTechnical subjects covered by former us classification11%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%
H01JElectric discharge tubes or discharge lamps4%
Y02ATechnologies for adaptation to climate change4%
B01DSeparation2%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry2%
B05CApparatus for applying fluent materials to surfaces, in general2%
B05DProcesses for applying fluent materials to surfaces, in general2%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1979–1992Patents assigned to RICOH KK (8)· patent assignee history
1985–1992Based in Numazu, JP· patent location history
1998Patents assigned to OSAKA GAS CO LTD (2)· patent assignee history
1998Based in Kyoto, JP· patent location history
2003–2020Patents assigned to KYOCERA CORP (3)· patent assignee history
2003–2020Based in Kyotanabe, JP· patent location history
2012Patents assigned to SAKAI HISASHI (3)· patent assignee history
2012Patents assigned to KISHITA KEISUKE (2)· patent assignee history
2012Based in Seto, JP· patent location history
2020Based in Moriguchi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
RICOH KK81979–1992
KYOCERA CORP32003–2020
SAKAI HISASHIself32012
KISHITA KEISUKE22012
OSAKA GAS CO LTD21998
Locations
LocationPatentsSpan
Numazu, JP71985–1992
Kyotanabe, JP22003–2020
Seto, JP22012
Kyoto, JP21998
Moriguchi, JP12020