Inventor
Tsai-Sen Lin
Inventor
Hsinchu, TW
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices27%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests18%
C23CCoating metallic material9%
G01NInvestigating or analysing materials by determining their chemical or physical properties9%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
PatentTitleYear
6,812,148'Preventing gate oxice thinning effect in a recess LOCOS process'20046,727,189'Method for detecting metal contamination on a silicon chip by implanting arsenic'20046,677,216'Method of making IC capacitor'20046,492,188'Monitor method for quality of metal ARC (antireflection coating) layer'20026,245,608'Ion implantation process for forming contact regions in semiconductor materials'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2004Patents assigned to MOSEL VITELIC INC (5)· patent assignee history
2001Based in Taichung, TW· patent location history
2002–2004Based in Hsinchu, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MOSEL VITELIC INC | 5 | 2001–2004 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hsinchu, TW | 4 | 2002–2004 |
| Taichung, TW | 1 | 2001 |