Inventor
Emiel Jozef Melanie Eussen
Inventor
Eindhoven, NL
Overview
Patents· 33 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices59%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
G01BMeasuring length, thickness or similar linear dimensions7%
G01DMeasuring not specially adapted for a specific variable5%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them2%
H01LSemiconductor devices2%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h102%
PatentTitleYear
10,331,045Position measurement system and lithographic apparatus20199,915,880'Stage apparatus, lithographic apparatus and method of positioning an object table'20189,696,638'Lithographic apparatus'20179,316,928'Stage apparatus, lithographic apparatus and method of positioning an object table'20169,229,340'Lithographic apparatus'20168,922,756'Position measurement system, lithographic apparatus and device manufacturing method'20148,836,913'Lithographic apparatus having an encoder type position sensor system'20148,781,775'Lithographic apparatus and method for correcting a position of a stage of a lithographic apparatus'20148,760,615'Lithographic apparatus having encoder type position sensor system'20148,730,485'Lithographic apparatus and device manufacturing method'20148,687,166'Lithographic apparatus having an encoder position sensor system'20148,614,783'Encoder-type measurement system, lithographic apparatus and method to detect an error on or in a grid or grating of an encoder-type measurement system'20138,570,492'Lithographic apparatus'20138,451,454'Stage system, lithographic apparatus including such stage system, and correction method'20138,400,617'Lithographic apparatus having a substrate support with open cell plastic foam parts'20138,279,407'Stage system and lithographic apparatus comprising such stage system'20128,248,583'Lithographic apparatus and calibration method'20128,174,671'Lithographic projection apparatus and method for controlling a support structure'20127,999,912'Lithographic apparatus and sensor calibration method'20117,978,339'Lithographic apparatus temperature compensation'20117,619,207'Lithographic apparatus and device manufacturing method'20097,602,489'Lithographic apparatus and device manufacturing method'20097,599,043'Position measurement system and lithographic apparatus'20097,557,903'Lithographic apparatus and device manufacturing method'20097,505,113'Lithographic apparatus and device manufacturing method'20097,474,409'Lithographic interferometer system with an absolute measurement subsystem and differential measurement subsystem and method thereof'20097,443,511'Integrated plane mirror and differential plane mirror interferometer system'20087,348,574'Position measurement system and lithographic apparatus'20087,310,130'Lithographic apparatus and position measuring method'20077,283,249'Lithographic apparatus and a method of calibrating such an apparatus'20077,242,454'Lithographic apparatus, and apparatus and method for measuring an object position in a medium'20077,177,059'Device and method for manipulation and routing of a metrology beam'20077,136,148'Lithographic apparatus and device manufacturing method'2006Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2006–2019Patents assigned to ASML NETHERLANDS BV (33)· patent assignee history
2006–2019Based in Eindhoven, NL· patent location history
2007–2008Based in Eijsden, NL· patent location history
2012–2016Patents assigned to VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS (14)· patent assignee history
2012–2016Patents assigned to EUSSEN EMIEL JOZEF MELANIE (12)· patent assignee history
2012–2014Patents assigned to LOOPSTRA ERIK ROELOF (5)· patent assignee history
2012–2014Patents assigned to KOENEN WILLEM HERMAN GERTRUDA ANNA (4)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 33 | 2006–2019 |
| VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS | 14 | 2012–2016 |
| EUSSEN EMIEL JOZEF MELANIEself | 12 | 2012–2016 |
| LOOPSTRA ERIK ROELOF | 5 | 2012–2014 |
| KOENEN WILLEM HERMAN GERTRUDA ANNA | 4 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Eindhoven, NL | 30 | 2006–2019 |
| Eijsden, NL | 3 | 2007–2008 |