Inventor
Byung-Gook Kim
Inventor
Seoul, KR
Overview
Patents· 27 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%
G06FElectric digital data processing9%
H01LSemiconductor devices7%
B82YSpecific uses or applications of nanostructures3%
G01BMeasuring length, thickness or similar linear dimensions3%
Y02DClimate change mitigation technologies in information and communication technologies [ict], i.e. information and communication technologies aiming at the reduction of their own energy use3%
B23KSoldering or unsoldering2%
B29CShaping or joining of plastics2%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form2%
PatentTitleYear
10,444,619Mask blank and phase shift mask using same201910,437,145Method of detaching a pellicle from a photomask201910,430,083Memory scheduling method for changing command order and method of operating memory system201910,217,635Method of manufacturing semiconductor device201910,114,552Memory scheduling method for changing command order and method of operating memory system201810,114,555Semiconductor device having register sets and data processing device including the same201810,073,337Pellicle and photomask assembly including the same201810,065,402Method of manufacturing pellicle assembly and method of photomask assembly including the same201810,042,246Method of manufacturing photomask20189,897,554'Method of inspecting surface and method of inspecting photomask using the same'20189,892,500'Method for grouping region of interest of mask pattern and measuring critical dimension of mask pattern using the same'20189,880,462'Pellicle and exposure mask including the same'20189,817,309'Photomasks, methods of fabricating the photomasks, and method of fabricating semiconductor devices by using the photomasks'20179,798,241'Methods of manufacturing photomasks, methods of forming photoresist patterns and methods of manufacturing semiconductor devices'20179,690,190'Pellicles and methods of manufacturing the same'20179,417,518'Photomask and method of manufacturing the same'20168,817,234'Optical device and exposure apparatus including the same'20148,683,594'Data storage devices including integrated anti-virus circuits and method of operating the same'20148,673,522'Method for manufacturing photomask and photomask manufactured using the same'20148,599,784'Femto base station and method for allocating radio resource thereof'20138,592,105'Photomasks and methods of fabricating the same'20138,578,503'Portable storage device and method of managing resource of the portable storage device'20138,475,980'Methods of forming semiconductor devices using photolithographic shot grouping'20138,329,381'Pattern forming method'20127,939,223'Photomask using separated exposure technique, method of fabricating photomask, and apparatus for fabricating photomask by using the method'20117,763,397'Photomask registration errors of which have been corrected and method of correcting registration errors of photomask'20107,369,254'System and method for measuring dimension of patterns formed on photomask'2008Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2008–2019Patents assigned to SAMSUNG ELECTRONICS CO LTD (26)· patent assignee history
2008–2019Based in Seoul, KR· patent location history
2011–2013Based in Suwon-si, KR· patent location history
2012–2017Patents assigned to KIM BYUNG-GOOK (9)· patent assignee history
2012–2014Patents assigned to CHOI JIN (4)· patent assignee history
2012–2014Patents assigned to KIM HEE-BOM (3)· patent assignee history
2012–2014Patents assigned to LEE SANG-HEE (3)· patent assignee history
2014–2019Based in Hwaseong-si, KR· patent location history
2019Based in Yongin-si, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 26 | 2008–2019 |
| KIM BYUNG-GOOKself | 9 | 2012–2017 |
| CHOI JIN | 4 | 2012–2014 |
| KIM HEE-BOM | 3 | 2012–2014 |
| LEE SANG-HEE | 3 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Seoul, KR | 20 | 2008–2019 |
| Hwaseong-si, KR | 4 | 2014–2019 |
| Suwon-si, KR | 2 | 2011–2013 |
| Yongin-si, KR | 1 | 2019 |