Inventor

Masatoshi Narahara

Inventor
Hitachinaka, JP

Overview

11→
Patents
2001–2021
Patent span
Physics
Primary field (CPC G)

Patents· 11 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties28%
C12QMeasuring or testing processes involving enzymes, nucleic acids or microorganisms17%
B01LChemical or physical laboratory apparatus for general use14%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry7%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
A61KPreparations for medical, dental or toiletry purposes3%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form3%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds3%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds3%
G01BMeasuring length, thickness or similar linear dimensions3%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001Based in Hitachi, JP· patent location history
2012–2021Patents assigned to HITACHI HIGH TECH CORP (10)· patent assignee history
2012–2016Patents assigned to NARAHARA MASATOSHI (7)· patent assignee history
2012–2015Patents assigned to SAITO TOSHIRO (5)· patent assignee history
2012–2016Based in Hitachinaka, JP· patent location history
2015–2016Patents assigned to INABA RYOJI (3)· patent assignee history
2015–2016Patents assigned to NAKAZAWA TARO (2)· patent assignee history
2018–2021Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI HIGH TECH CORP102012–2021
NARAHARA MASATOSHIself72012–2016
SAITO TOSHIRO52012–2015
INABA RYOJI32015–2016
NAKAZAWA TARO22015–2016
Locations
LocationPatentsSpan
Hitachinaka, JP72012–2016
Tokyo, JP32018–2021
Hitachi, JP12001