Inventor
Hiromitsu Wakabayashi
Inventor
Yokohama, JP
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests50%
PatentTitleYear
5,756,254'Resist, method of forming a resist pattern and manufacturing an electronic parts using the resist'19985,744,281'Resist composition for forming a pattern and method of forming a pattern wherein the composition 4-phenylpyridine as an additive'19985,658,706'Resist composition for forming a pattern comprising a pyridinium compound as an additive'1997Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1997–1998Patents assigned to TOSHIBA KK (3)· patent assignee history
1997–1998Based in Yokohama, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOSHIBA KK | 3 | 1997–1998 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yokohama, JP | 3 | 1997–1998 |