Inventor
TING-HUNG HSU
Inventor
TW
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices31%
H10DInorganic electric semiconductor devices31%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1014%
B82YSpecific uses or applications of nanostructures7%
PatentTitleYear
12,538,569Tuning tensile strain on FinFET202612,205,819Method and device for forming metal gate electrodes for transistors202511,855,168Semiconductor device and manufacturing method thereof202311,855,087Semiconductor device and fabricating the same202311,557,660Method and device for forming cut-metal-gate feature202311,521,858Method and device for forming metal gate electrodes for transistors202211,309,396Semiconductor device and manufacturing method thereof202211,205,594Fin spacer protected source and drain regions in FinFETs202111,152,487Method for manufacturing semiconductor device2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (9)· patent assignee history
2021–2026Based in TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 9 | 2021–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| TW | 9 | 2021–2026 |