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Inventor

Muneki Hamashima

Inventor
Fukaya, JP

Overview

42→
Patents
1988–2019
Patent span
Electricity
Primary field (CPC H)

Patents· 42 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps26%
G01NInvestigating or analysing materials by determining their chemical or physical properties19%
H04NPictorial communication, e.g. television16%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation8%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them7%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices6%
B82YSpecific uses or applications of nanostructures4%
H01LSemiconductor devices3%
F01NGas-flow silencers or exhaust apparatus for machines or engines in general2%
G02BOptical elements, systems or apparatus2%
PatentTitleYear
10,429,402Washing/drying apparatus, screening apparatus, washing/drying method, and screening method201910,412,358Image sensor, image-capturing apparatus and image-capturing system201910,027,942Imaging processing apparatus, image-capturing apparatus, and storage medium having image processing program stored thereon20189,906,770'Image sensor, image-capturing apparatus and image capturing system'20189,888,226'Image capturing device and program to control image capturing device'20189,860,516'Image processing apparatus, image processing method and recording medium'20189,854,224Image processing apparatus, image capturing apparatus, and image processing program20179,838,665Image processing device, imaging device, and image processing program20179,727,985'Image processing apparatus, image-capturing apparatus, and storage medium having image processing program stored thereon'20179,706,190'Image processing apparatus and image processing program'20179,706,186'Imaging apparatus for generating parallax image data'20179,693,036'Imaging apparatus, image processing device, computer-readable medium having stored thereon an imaging apparatus controlling program, and computer-readable medium having stored thereon an image processing program'20179,532,033'Image sensor and imaging device'20169,414,046'Image sensor, imaging device and image processing device'20169,341,935'Image capturing device'20167,888,642'Electron beam apparatus and method of manufacturing semiconductor device using the apparatus'2011RE041665'Object observation apparatus and object observation'20107,745,784'Electron beam apparatus and method of manufacturing semiconductor device using the apparatus'20107,601,972'Inspection system by charged particle beam and method of manufacturing devices using the system'20097,598,471'Method of electric discharge machining a cathode for an electron gun'20097,439,502'Electron beam apparatus and device production method using the electron beam apparatus'20087,423,267'Electron beam apparatus and method of manufacturing semiconductor device using the apparatus'2008RE040221'Object observation apparatus and object observation'20087,297,949'Inspection system by charged particle beam and method of manufacturing devices using the system'20077,247,848'Electron beam apparatus and method of manufacturing semiconductor device using the apparatus'20077,244,932'Electron beam apparatus and device fabrication method using the electron beam apparatus'20077,205,559'Electron beam apparatus and device manufacturing method using same'20077,135,676'Inspection system by charged particle beam and method of manufacturing devices using the system'20067,129,485'Electron beam apparatus and method of manufacturing semiconductor device using the apparatus'20067,109,483'Method for inspecting substrate, substrate inspecting system and electron beam apparatus'20067,095,022'Electron beam apparatus and method of manufacturing semiconductor device using the apparatus'20066,953,944'Scanning device and method including electric charge movement'20056,670,602'Scanning device and scanning method'20036,593,152'Electron beam apparatus and method of manufacturing semiconductor device using the apparatus'20036,479,819'Object observation apparatus and object observation'20026,365,897'Electron beam type inspection device and method of making same'20026,184,526'Apparatus and method for inspecting predetermined region on surface of specimen using electron beam'20016,011,262'Object observing apparatus and method for adjusting the same'20005,479,537'Image processing method and apparatus'19955,373,567'Method and apparatus for pattern matching'19944,769,551'Pattern detecting apparatus utilizing energy beam'19884,744,663'Pattern position detection apparatus using laser beam'1988

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1988–2018Patents assigned to NIPPON KOGAKU KK (8)· patent assignee history
1988–2005Based in Tokyo, JP· patent location history
1994–2019Patents assigned to NIKON CORP (21)· patent assignee history
1994–2010Based in Urayasu, JP· patent location history
2000–2009Based in Chiba, JP· patent location history
2003–2011Patents assigned to EBARA CORP (14)· patent assignee history
2003–2010Based in Saitama, JP· patent location history
2016–2017Patents assigned to HAMASHIMA MUNEKI (3)· patent assignee history
2016–2017Patents assigned to MORI SUSUMU (2)· patent assignee history
2016–2019Based in Fukaya, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NIKON CORP211994–2019
EBARA CORP142003–2011
NIPPON KOGAKU KK81988–2018
HAMASHIMA MUNEKIself32016–2017
MORI SUSUMU22016–2017
Locations
LocationPatentsSpan
Fukaya, JP152016–2019
Saitama, JP112003–2010
Urayasu, JP71994–2010
Chiba, JP42000–2009
Tokyo, JP41988–2005