Inventor
Mark Kroon
Inventor
Utrecht, NL
Overview
Patents· 28 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices80%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
B08BCleaning in general3%
PatentTitleYear
11,003,096Lithographic apparatus and device manufacturing method202110,678,139Lithographic apparatus and device manufacturing method202010,514,618Lithographic apparatus and device manufacturing method201910,180,629Lithographic apparatus and device manufacturing method201910,025,204Lithographic apparatus and device manufacturing method20189,568,841'Lithographic apparatus and device manufacturing method'20179,541,843'Lithographic apparatus and device manufacturing method involving a sensor detecting a radiation beam through liquid'20179,316,919'Lithographic apparatus and device manufacturing method'20169,152,058'Lithographic apparatus and device manufacturing method involving a member and a fluid opening'20159,081,299'Lithographic apparatus and device manufacturing method involving removal of liquid entering a gap'20158,947,637'Lithographic apparatus and device manufacturing method'20158,482,845'Lithographic apparatus and device manufacturing method'20138,154,708'Lithographic apparatus and device manufacturing method'20128,077,287'Method of preparing components, prepared component, lithographic apparatus and device manufacturing method'20118,035,798'Lithographic apparatus and device manufacturing method'20117,907,255'Lithographic apparatus and device manufacturing method'20117,599,811'Sensor for lithographic apparatus and method of obtaining measurements of lithographic apparatus'20097,459,690'Lithographic apparatus, device manufacturing method, and device manufactured thereby'20087,315,346'Lithographic apparatus and device manufacturing method'20087,274,432'Radiation system, lithographic apparatus, device manufacturing method, and device manufactured thereby'20077,230,674'Lithographic apparatus and device manufacturing method'20077,213,963'Lithographic apparatus and device manufacturing method'20077,145,641'Lithographic apparatus, device manufacturing method, and device manufactured thereby'20067,142,287'Lithographic apparatus, device manufacturing method, and device manufactured thereby'20067,075,620'Lithographic apparatus, device manufacturing method, and device manufactured thereby'20066,888,151'Lithographic apparatus, device manufacturing method, and device manufactured thereby'20056,747,282'Lithographic apparatus, device manufacturing method, and device manufactured thereby'20046,721,389'Lithographic apparatus, device manufacturing method, and device manufactured thereby'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2021Patents assigned to ASML NETHERLANDS BV (28)· patent assignee history
2004–2021Based in Utrecht, NL· patent location history
2011–2017Patents assigned to KROON MARK (7)· patent assignee history
2012–2017Patents assigned to SENGERS TIMOTHEUS FRANCISCUS (6)· patent assignee history
2012–2017Patents assigned to BIJLAART ERIK THEODORUS MARIA (5)· patent assignee history
2012–2017Patents assigned to BUTLER HANS (5)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 28 | 2004–2021 |
| KROON MARKself | 7 | 2011–2017 |
| SENGERS TIMOTHEUS FRANCISCUS | 6 | 2012–2017 |
| BIJLAART ERIK THEODORUS MARIA | 5 | 2012–2017 |
| BUTLER HANS | 5 | 2012–2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Utrecht, NL | 28 | 2004–2021 |