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Inventor

Kazushige Dohtani

Inventor
Kawasaki, JP

Overview

2→
Patents
2015
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C07Cprimary
C07CAcyclic or carbocyclic compounds22%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices22%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
C07DHeterocyclic compounds11%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds11%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests11%
PatentTitleYear
9,023,581'Resist composition, method of forming resist pattern, polymeric compound, and compound'20158,932,795'Resist composition, method of forming resist pattern, novel compound, and acid generator'2015

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2015Patents assigned to DOHTANI KAZUSHIGE (2)· patent assignee history
2015Patents assigned to TOKYO OHKA KOGYO CO LTD (2)· patent assignee history
2015Patents assigned to UTSUMI YOSHIYUKI (2)· patent assignee history
2015Patents assigned to IWASHITA JUN (1)· patent assignee history
2015Patents assigned to KAWAUE AKIYA (1)· patent assignee history
2015Based in Kawasaki, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
DOHTANI KAZUSHIGEself22015
TOKYO OHKA KOGYO CO LTD22015
UTSUMI YOSHIYUKI22015
IWASHITA JUN12015
KAWAUE AKIYA12015
Locations
LocationPatentsSpan
Kawasaki, JP22015