Inventor
Hirotaka Tagoshi
Inventor
Oita, JP
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C08Fprimary
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds22%
C07CAcyclic or carbocyclic compounds11%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices11%
A01GHorticulture6%
C04BLime, magnesia6%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients6%
C08LCompositions of macromolecular compounds6%
C09DCoating compositions, e.g. paints, varnishes or lacquers6%
C12NMicroorganisms or enzymes6%
G02BOptical elements, systems or apparatus6%
PatentTitleYear
6,783,840'Resist ink composition'20046,342,330'Photosensitive compositions and pattern formation method'20026,153,185'Plant-containing composition'20006,090,899'Terpolymers of unsaturated sulfonates, N-vinylamides and ethylenic monomers'20005,395,895'Resin composition and a molded article utilizing it'19955,270,439'Method of producing a curable composition containing 4,4\'-bis(methacryloylthio)diphenylsulfide'19935,183,917'4,4\'-bis(methacryloylthio)diphenylsulfide'19934,518,756'Biphenyloxy mono- and dimethacrylate polymerizable compositions'1985Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1985–2004Patents assigned to SHOWA DENKO KK (7)· patent assignee history
1985Patents assigned to SHOWA HIGHPOLYMER (1)· patent assignee history
1985–1995Based in Oita, JP· patent location history
1993Patents assigned to SUMITOMO SEIKA CHEMICALS (1)· patent assignee history
2000–2004Based in Chiba, JP· patent location history
2000Based in Tokyo, JP· patent location history
2002Patents assigned to TOYO GOSEI KOGYO KK (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHOWA DENKO KK | 7 | 1985–2004 |
| SHOWA HIGHPOLYMER | 1 | 1985 |
| SUMITOMO SEIKA CHEMICALS | 1 | 1993 |
| TOYO GOSEI KOGYO KK | 1 | 2002 |
Locations
| Location | Patents | Span |
|---|---|---|
| Oita, JP | 4 | 1985–1995 |
| Chiba, JP | 3 | 2000–2004 |
| Tokyo, JP | 1 | 2000 |