Inventor

Hans Van Der Laan

Inventor

Veldhoven, NL

Overview

1976–2020

Patent span

Physics

Primary field (CPC G)

Patents· 39 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices55%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%

G01NInvestigating or analysing materials by determining their chemical or physical properties10%

G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light4%

G01MTesting static or dynamic balance of machines or structures3%

B66FHoisting, lifting, hauling or pushing, not otherwise provided for, e.g. devices which apply a lifting or pushing force directly to the surface of a load1%

B82YSpecific uses or applications of nanostructures1%

G01BMeasuring length, thickness or similar linear dimensions1%

G02BOptical elements, systems or apparatus1%

G03BApparatus or arrangements for taking photographs or for projecting or viewing them1%

PatentTitleYear

10,635,004Correction using stack difference2020 10,578,982Substrate measurement recipe design of, or for, a target including a latent image2020 10,551,750Metrology method and apparatus and associated computer product2020 10,310,388Metrology method and apparatus and associated computer product2019 9,958,789Method of metrology, inspection apparatus, lithographic system and device manufacturing method2018 8,937,705'Lithographic apparatus and device manufacturing method with radiation beam inspection using moveable reflecting device'2015 8,773,657'Method to determine the value of process parameters based on scatterometry data'2014 8,717,540'Calculating a laser metric within a lithographic apparatus and method thereof'2014 8,570,489'Lithographic projection apparatus and method of compensating perturbation factors'2013 8,554,510'Method of measuring properties of dynamic positioning errors in a lithographic apparatus, data processing apparatus, and computer program product'2013 8,279,405'Lithographic apparatus and device manufacturing method'2012 8,208,122'Method of measuring a lithographic projection apparatus'2012 8,134,683'Device manufacturing method, computer program and lithographic apparatus'2012 7,697,116'Lithographic apparatus and device manufacturing method'2010 7,663,741'Lithographic apparatus, device manufacturing method, calibration method and computer program product'2010 7,505,116'Lithographic apparatus and device manufacturing method'2009 7,459,690'Lithographic apparatus, device manufacturing method, and device manufactured thereby'2008 7,443,486'Method for predicting a critical dimension of a feature imaged by a lithographic apparatus'2008 7,403,293'Metrology apparatus, lithographic apparatus, process apparatus metrology method and device manufacturing method'2008 7,382,438'Lithographic apparatus and device manufacturing method'2008 7,312,860'Test pattern, inspection method, and device manufacturing method'2007 7,274,434'Lithographic apparatus and device manufacturing method'2007 7,177,010'Lithographic apparatus and device manufacturing method'2007 7,170,587'Lithographic apparatus and device manufacturing method'2007 7,151,594'Test pattern, inspection method, and device manufacturing method'2006 7,112,813'Device inspection method and apparatus using an asymmetric marker'2006 7,075,620'Lithographic apparatus, device manufacturing method, and device manufactured thereby'2006 7,042,550'Device manufacturing method and computer program'2006 6,963,391'Lithographic apparatus and device manufacturing method'2005 6,960,775'Lithographic apparatus, device manufacturing method and device manufactured thereby'2005 6,940,587'Lithographic apparatus and a measurement system'2005 6,897,947'Method of measuring aberration in an optical imaging system'2005 6,787,789'Method of measuring aberration of a projection system of a lithographic apparatus, device manufacturing method, and device manufactured thereby'2004 6,721,389'Lithographic apparatus, device manufacturing method, and device manufactured thereby'2004 6,710,856'Method of operating a lithographic apparatus, lithographic apparatus, method of manufacturing a device, and device manufactured thereby'2004 6,650,399'Lithographic projection apparatus, a grating module, a sensor module, a method of measuring wave front aberrations'2003 6,646,729'Method of measuring aberration in an optical imaging system'2003 6,028,660'Illumination unit for an optical apparatus'2000 3,937,346'Movable stacking device'1976

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1976Based in Kamerik, NL· patent location history

2000–2020Based in Veldhoven, NL· patent location history

2003–2020Patents assigned to ASML NETHERLANDS BV (36)· patent assignee history

2012–2015Patents assigned to VAN DER LAAN HANS (8)· patent assignee history

2012–2014Patents assigned to STAALS FRANK (3)· patent assignee history

2012–2014Patents assigned to DE WINTER LAURENTIUS CORNELIUS (2)· patent assignee history

2012–2013Patents assigned to HOFMANS GERARDUS CAROLUS JOHANNUS (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
ASML NETHERLANDS BV	36	2003–2020
VAN DER LAAN HANSself	8	2012–2015
STAALS FRANK	3	2012–2014
DE WINTER LAURENTIUS CORNELIUS	2	2012–2014
HOFMANS GERARDUS CAROLUS JOHANNUS	2	2012–2013

Locations

Location	Patents	Span
Veldhoven, NL	38	2000–2020
Kamerik, NL	1	1976