Inventor
XiaoMin Yang
Inventor
Livermore, CA, US
Overview
Patents· 40 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G11Bprimary
G11BInformation storage based on relative movement between record carrier and transducer18%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices15%
B82YSpecific uses or applications of nanostructures10%
Y10TTechnical subjects covered by former us classification9%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
H01LSemiconductor devices4%
C12QMeasuring or testing processes involving enzymes, nucleic acids or microorganisms4%
G01NInvestigating or analysing materials by determining their chemical or physical properties4%
B05DProcesses for applying fluent materials to surfaces, in general3%
PatentTitleYear
10,731,210Fabrication of nanochannel with integrated electrodes for DNA sequencing using tunneling current202010,655,164Single molecule DNA sequencing method using confined nano-fluidic channel and sub-nanometer electrode gap202010,641,726Fabrication of a nanochannel for DNA sequencing using electrical plating to achieve tunneling electrode gap202010,640,827Fabrication of wedge shaped electrode for enhanced DNA sequencing using tunneling current202010,564,119Direct sequencing device with a top-bottom electrode pair202010,529,366Sidewall guided directed self assembly data storage medium202010,151,978Methods and apparatuses for directed self-assembly20189,992,767Data transmission method and device20189,934,806Apparatus for methods for aligned servo-related features20189,928,867'Templates for patterned media'20189,865,294'Servo integrated BPM template'20189,837,274Hard-mask defined bit pattern substrate20179,773,520'Imprint pattern guided self-assembly of lamellar block copolymer for BPM'20179,638,995'Method of sheared guiding patterns'20179,626,996'Block copolymer self-assembly for pattern density multiplication and rectification'20179,620,161'Apparatus and methods for aligned servo-related features'20179,489,974'Method of fabricating a BPM template using hierarchical BCP density patterns'20169,469,525'Modified surface for block copolymer self-assembly'20169,424,872'Imprint template for patterned recording media'20169,299,609'Hard-mask defined bit pattern substrate'20169,269,388'Chemical pinning to direct addressable array using self-assembling materials'20169,171,703'Apparatus with sidewall protection for features'20159,079,216'Methods of patterning with protective layers'20158,993,060'Chemical pinning to direct addressable array using self-assembling materials'20158,941,938'Apparatus and methods for circumferentially aligned features'20158,911,846'Block copolymer assembly'20148,848,315'Pole for magnetic recording'20148,729,952'Switching device with non-negative biasing'20148,673,541'Block copolymer assembly methods and patterns formed thereby'20148,404,432'Lithography process'20138,268,545'Formation of a device using block copolymer lithography'20128,259,411'Fabrication of trapezoidal pole for magnetic recording'20128,008,988'Radio frequency switch with improved intermodulation distortion through use of feed forward capacitor'20117,713,753'Dual-level self-assembled patterning method and apparatus fabricated using the method'20107,521,137'Patterned thin films and use of such films as thermal control layers in heat assisted magnetic recording media'20097,153,597'Magnetic recording media having chemically modified patterned substrate to assemble self organized magnetic arrays'20066,926,953'Guided self-assembly of block copolymer films on interferometrically nanopatterned substrates'20056,822,833'Disc drive magnetic component with self assembled features'20046,815,358'Electron beam lithography method for plating sub-100 nm trenches'20046,746,825'Guided self-assembly of block copolymer films on interferometrically nanopatterned substrates'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2020Patents assigned to SEAGATE TECHNOLOGY LLC (35)· patent assignee history
2004–2015Based in Sewickley, PA, US· patent location history
2004–2005Based in Madison, WI, US· patent location history
2012–2016Patents assigned to YANG XIAOMIN (8)· patent assignee history
2012–2015Patents assigned to XIAO SHUAIGANG (6)· patent assignee history
2012–2014Patents assigned to GONG JIE (2)· patent assignee history
2012–2014Patents assigned to SEIGLER MICHAEL (2)· patent assignee history
2014–2020Based in Livermore, CA, US· patent location history
2018Based in Shenzhen, CN· patent location history
2018Based in Liv, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SEAGATE TECHNOLOGY LLC | 35 | 2004–2020 |
| YANG XIAOMINself | 8 | 2012–2016 |
| XIAO SHUAIGANG | 6 | 2012–2015 |
| GONG JIE | 2 | 2012–2014 |
| SEIGLER MICHAEL | 2 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Livermore, California, US | 24 | 2014–2020 |
| Sewickley, Pennsylvania, US | 9 | 2004–2015 |
| Madison, WI, US | 2 | 2004–2005 |
| Shenzhen, CN | 1 | 2018 |
| Liv, California, US | 1 | 2018 |