Inventor

Marco Hendrikus Hermanus Oude Nijhuis

Inventor
Eindhoven, NL

Overview

7→
Patents
2012–2020
Patent span
Physics
Primary field (CPC G)

Patents· 7 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
F16FSprings21%
F16JPistons7%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them7%
G10KSound-producing devices7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2012–2020Patents assigned to ASML NETHERLANDS BV (7)· patent assignee history
2012–2016Patents assigned to BUTLER HANS (5)· patent assignee history
2012–2016Patents assigned to OUDE NIJHUIS MARCO HENDRIKUS HERMANUS (5)· patent assignee history
2012–2016Patents assigned to VAN DER WIJST MARC WILHELMUS MARIA (4)· patent assignee history
2012–2016Patents assigned to BEIJERS CLEMENTIUS ANDREAS JOHANNES (3)· patent assignee history
2012–2020Based in Eindhoven, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV72012–2020
BUTLER HANS52012–2016
OUDE NIJHUIS MARCO HENDRIKUS HERMANUSself52012–2016
VAN DER WIJST MARC WILHELMUS MARIA42012–2016
BEIJERS CLEMENTIUS ANDREAS JOHANNES32012–2016
Locations
LocationPatentsSpan
Eindhoven, NL72012–2020