Inventor
ASHUR J. ATANOS
Inventor
US
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
H01LSemiconductor devices19%
C23CCoating metallic material16%
C30BSingle-crystal growth16%
H01JElectric discharge tubes or discharge lamps16%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light3%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
G01TMeasurement of nuclear or x-radiation3%
PatentTitleYear
12,592,363Actively controlled gas inject for process temperature control202612,519,005Thickness uniformity improvement kit for thermally sensitive epitaxial processing202612,456,614Process kits and related methods for processing chambers to facilitate deposition process adjustability202512,417,890Methods, systems, and apparatus for monitoring radiation output of lamps202512,354,855Process kits and related methods for processing chambers to facilitate deposition process adjustability202512,270,752EPI self-heating sensor tube as in-situ growth rate sensor202512,243,761Detection and analysis of substrate support and pre-heat ring in a process chamber via imaging202512,221,696Process kits and related methods for processing chambers to facilitate deposition process adjustability2025Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2025–2026Patents assigned to APPLIED MATERIALS INC (8)· patent assignee history
2025–2026Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 8 | 2025–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 8 | 2025–2026 |