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Inventor

Joerg Rockenberger

Inventor
Redwood City, CA, US

Overview

61→
Patents
2002–2017
Patent span
Chemistry
Primary field (CPC C)

Patents· 61 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
H10DInorganic electric semiconductor devices12%
C09DCoating compositions, e.g. paints, varnishes or lacquers8%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds7%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium6%
C08LCompositions of macromolecular compounds5%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
B82YSpecific uses or applications of nanostructures4%
C01BNon-metallic elements4%
H01LSemiconductor devices4%
PatentTitleYear
9,704,713'Siloxanes, doped siloxanes, methods for their synthesis, compositions containing the same, and films formed therefrom'20179,640,390'Method for modifying and controlling the threshold voltage of thin film transistors'20179,400,953'Laser processing enabling radio frequency identification (RFID) customization'20169,336,925'Siloxanes, doped siloxanes, methods for their synthesis, compositions containing the same, and films formed therefrom'20169,196,641'Printed dopant layers'20159,045,653'Print processing for patterned conductor, semiconductor and dielectric materials'20158,960,558'MOS electronic article surveillance, RF and/or RF identification tag/device, and methods for making and using the same'20158,900,915'Epitaxial structures and methods of forming the same'20148,853,677'Metal inks for improved contact resistance'20148,846,507'Silicon polymers, methods of polymerizing silicon compounds, and methods of forming thin films from such silicon polymers'20148,840,857'Heterocyclic semiconductor precursor compounds, compositions containing the same, and methods of making such compounds and compositions'20148,796,125'Printed, self-aligned, top gate thin film transistor'20148,758,982'Laser processing enabling radio frequency identification (RFID) customization'20148,624,049'Dopant group-substituted semiconductor precursor compounds, compositions containing the same, and methods of making such compounds and compositions'20148,617,992'Method of forming metal silicide contact and metal interconnect'20138,603,426'Method of making a silicon-containing film'20138,530,589'Print processing for patterned conductor, semiconductor and dielectric materials'20138,461,284'Silicon polymers, methods of polymerizing silicon compounds, and methods of forming thin films from such silicon polymers'20138,461,628'MOS transistor with laser-patterned metal gate, and method for making the same'20138,460,983'Method for modifying and controlling the threshold voltage of thin film transistors'20138,455,604'Polysilane compositions, methods for their synthesis and films formed therefrom'20138,372,194'Methods of forming a doped semiconductor thin film, doped semiconductor thin film structures, doped silane compositions, and methods of making such compositions'20138,367,031'Silane compositions, methods of making the same, method for forming a semiconducting and/or silicon-containing film, and thin film structures formed therefrom'20138,304,780'Printed dopant layers'20128,242,227'Doped polysilanes, compositions containing the same, methods for making the same, and films formed therefrom'20128,236,916'Polysilane compositions, methods for their synthesis and films formed therefrom'20128,211,396'Heterocyclic semiconductor precursor compounds, compositions containing the same, and methods of making such compounds and compositions'20128,164,423'MOS electronic article surveillance, RF and/or RF identification tag/device, and methods for making and using the same'20128,158,518'Methods of making metal silicide contacts, interconnects, and/or seed layers'20128,124,040'Methods of making silane compositions'20128,092,867'Silicon polymers, methods of polymerizing silicon compounds, and methods of forming thin films from such silicon polymers'20128,066,805'Metal inks, methods of making the same, and methods for printing and/or forming metal films'20118,057,865'Polysilane compositions, methods for their synthesis and films formed therefrom'20117,981,482'Methods of forming a doped semiconductor thin film, doped semiconductor thin film structures, doped silane compositions, and methods of making such compositions'20117,977,240'Metal inks for improved contact resistance'20117,951,892'Doped polysilanes, compositions containing the same, methods for making the same, and films formed therefrom'20117,879,696'Compositions and methods for forming a semiconducting and/or silicon-containing film, and structures formed therefrom'20117,799,302'Silane compositions, methods of making the same, method for forming a semiconducting and/or silicon-containing film, and thin film structures formed therefrom'20107,767,261'Methods for forming passivated semiconductor nanoparticles'20107,767,520'Printed dopant layers'20107,723,457'Polysilane compositions, methods for their synthesis and films formed therefrom'20107,701,011'Printed dopant layers'20107,674,926'Dopant group-substituted semiconductor precursor compounds, compositions containing the same, and methods of making such compounds and compositions'20107,553,545'Compositions and methods for forming a semiconducting and/or silicon-containing film, and structures formed therefrom'20097,498,015'Method of making silane compositions'20097,491,782'Polysilane compositions, methods for their synthesis and films formed therefrom'20097,485,691'Polysilane compositions, methods for their synthesis and films formed therefrom'20097,422,708'Compositions for forming a semiconducting and/or silicon-containing film, and structures formed therefrom'20087,387,260'MOS electronic article surveillance, RF and/or RF identification tag/device, and methods for making and using the same'20087,314,513'Methods of forming a doped semiconductor thin film, doped semiconductor thin film structures, doped silane compositions, and methods of making such compositions'20087,315,068'Interface layer for the fabrication of electronic devices'20087,294,449'Radiation patternable functional materials, methods of their use, and structures formed therefrom'20077,259,100'Nanoparticles and method for making the same'20077,259,101'Nanoparticles and method for making the same'20077,152,804'MOS electronic article surveillance, RF and/or RF identification tag/device, and methods for making and using the same'20067,078,276'Nanoparticles and method for making the same'20066,984,369'Process for making surfactant capped metal oxide nanocrystals, and products produced by the process'20066,957,608'Contact print methods'20056,911,385'Interface layer for the fabrication of electronic devices'20056,878,184'Nanoparticle synthesis and the formation of inks therefrom'20056,440,213'Process for making surfactant capped nanocrystals'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002–2006Based in Berkeley, CA, US· patent location history
2005–2014Patents assigned to KOVIO INC (47)· patent assignee history
2005–2015Based in Redwood City, CA, US· patent location history
2010–2017Based in San Jose, CA, US· patent location history
2011–2015Patents assigned to ROCKENBERGER JOERG (27)· patent assignee history
2011–2014Patents assigned to GUO WENZHUO (13)· patent assignee history
2011–2014Patents assigned to RIDLEY BRENT (13)· patent assignee history
2014–2017Patents assigned to THIN FILM ELECTRONICS ASA (12)· patent assignee history
2014–2016Based in Tahoma, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
KOVIO INC472005–2014
ROCKENBERGER JOERGself272011–2015
GUO WENZHUO132011–2014
RIDLEY BRENT132011–2014
THIN FILM ELECTRONICS ASA122014–2017
Locations
LocationPatentsSpan
Redwood City, California, US362005–2015
San Jose, California, US212010–2017
Tahoma, California, US22014–2016
Berkeley, California, US22002–2006