LexDanaLexDanabeta
Inventor

Stanley W. Drazkiewicz

Inventor
Norwalk, CT, US

Overview

3→
Patents
2004–2017
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices38%
G02BOptical elements, systems or apparatus25%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light25%
G01BMeasuring length, thickness or similar linear dimensions13%
PatentTitleYear
9,551,939'Mark position measuring apparatus and method, lithographic apparatus and device manufacturing method'20177,027,129'System for laser beam expansion without expanding spatial coherence'20066,801,299'System for laser beam expansion without expanding spatial coherence'2004

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004–2017Patents assigned to ASML HOLDING NV (3)· patent assignee history
2004–2017Based in Norwalk, CT, US· patent location history
2017Patents assigned to ASML NETHERLANDS BV (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML HOLDING NV32004–2017
ASML NETHERLANDS BV12017
Locations
LocationPatentsSpan
Norwalk, CT, US32004–2017