Inventor
Rodney L. Robison
Inventor
East Berne, NY, US
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps23%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
C23CCoating metallic material16%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
H01LSemiconductor devices7%
B05BSpraying apparatus5%
B05CApparatus for applying fluent materials to surfaces, in general5%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices5%
B23BTurning2%
G01BMeasuring length, thickness or similar linear dimensions2%
PatentTitleYear
10,426,001Processing system for electromagnetic wave treatment of a substrate at microwave frequencies201910,403,501High-purity dispense system201910,354,872High-precision dispense system with meniscus control20198,194,384'High temperature electrostatic chuck and method of using'20128,028,655'Plasma processing system with locally-efficient inductive plasma coupling'20117,901,545'Ionized physical vapor deposition (iPVD) process'20117,810,449'Plasma processing system with locally-efficient inductive plasma coupling'20107,776,748'Selective-redeposition structures for calibrating a plasma process'20107,772,110'Electrical contacts for integrated circuits and methods of forming using gas cluster ion beam processing'20107,749,398'Selective-redeposition sources for calibrating a plasma process'20107,744,735'Ionized PVD with sequential deposition and etching'20107,591,935'Enhanced reliability deposition baffle for iPVD'20097,273,533'Plasma processing system with locally-efficient inductive plasma coupling'20076,755,945'Ionized PVD with sequential deposition and etching'20046,183,615'Transport system for wafer processing line'20015,408,322'Self aligning in-situ ellipsometer and method of using for process monitoring'1995Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1995Patents assigned to MATERIALS RESEARCH CORP (1)· patent assignee history
1995–2001Based in Kingston, NY, US· patent location history
2001–2019Patents assigned to TOKYO ELECTRON LTD (15)· patent assignee history
2004–2011Based in Mesa, AZ, US· patent location history
2009–2019Based in East Berne, NY, US· patent location history
2012Patents assigned to FUJISATO TOSHIAKI (1)· patent assignee history
2012Patents assigned to NASMAN RONALD (1)· patent assignee history
2012Patents assigned to ROBISON RODNEY L (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 15 | 2001–2019 |
| FUJISATO TOSHIAKI | 1 | 2012 |
| MATERIALS RESEARCH CORP | 1 | 1995 |
| NASMAN RONALD | 1 | 2012 |
| ROBISON RODNEY Lself | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| East Berne, New York, US | 9 | 2009–2019 |
| Mesa, AZ, US | 5 | 2004–2011 |
| Kingston, New York, US | 2 | 1995–2001 |