Inventor
Yiping Hsiao
Inventor
San Jose, CA, US
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G11Bprimary
G11BInformation storage based on relative movement between record carrier and transducer24%
B24BMachines, devices, or processes for grinding or polishing16%
G01NInvestigating or analysing materials by determining their chemical or physical properties16%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices11%
Y10TTechnical subjects covered by former us classification11%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
C25DProcesses for the electrolytic or electrophoretic production of coatings3%
PatentTitleYear
7,339,763'Disk drive thin-film inductive write head with pole tip structure having reduced susceptibility to corrosion'20087,137,190'Method for fabricating a magnetic transducer with a corrosion resistant layer on metallic thin films by nitrogen exposure'20066,913,704'Magnetic head induction coil fabrication method utilizing aspect ratio dependent etching'20056,804,878'Method of improving the reliability of magnetic head sensors by ion milling smoothing'20046,589,436'Method of adjusting the flatness of a slider using selective plasma etching'20036,515,826'Magnetic head induction coil fabrication method utilizing aspect ratio dependent etching'20036,512,382'Method for corrosion susceptibility testing of magnetic heads using simulated disk corrosion products'20036,503,406'Method for forming the air bearing surface of a slider using nonreactive plasma'20036,416,935'Method for forming the air bearing surface of a slider'20026,001,235'Rotary plater with radially distributed plating solution'19995,788,801'Real time measurement of etch rate during a chemical etching process'19985,582,746'Real time measurement of etch rate during a chemical etching process'19965,573,624'Chemical etch monitor for measuring film etching uniformity during a chemical etching process'19965,516,399'Contactless real-time in-situ monitoring of a chemical etching'19965,501,766'Minimizing overetch during a chemical etching process'19965,500,073'Real time measurement of etch rate during a chemical etching process'19965,489,361'Measuring film etching uniformity during a chemical etching process'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996–2003Patents assigned to IBM (13)· patent assignee history
1996–2008Based in San Jose, CA, US· patent location history
2004–2008Patents assigned to HITACHI GLOBAL STORAGE TECH (4)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 13 | 1996–2003 |
| HITACHI GLOBAL STORAGE TECH | 4 | 2004–2008 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Jose, California, US | 17 | 1996–2008 |