Inventor

Fu-Tien Weng

Inventor

Hsinchu, TW

Overview

16→

Patents

1999–2015

Patent span

Electricity

Primary field (CPC H)

Patents· 16 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Fprimary

H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation44%

G02BOptical elements, systems or apparatus19%

H01LSemiconductor devices9%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%

B29DProducing particular articles from plastics or from substances in a plastic state6%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%

C23CCoating metallic material3%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices3%

PatentTitleYear

9,128,218'Microlens structure and fabrication method thereof'2015 9,117,714'Wafer level package and mask for fabricating the same'2015 8,664,680'Color filter structure and method for fabricating the same'2014 8,129,762'Image sensor'2012 7,704,778'Microlens structure for image sensors'2010 7,507,598'Image sensor fabrication method and structure'2009 7,505,206'Microlens structure for improved CMOS image sensor sensitivity'2009 7,372,497'Effective method to improve sub-micron color filter sensitivity'2008 7,264,976'Advance ridge structure for microlens gapless approach'2007 7,071,032'Material to improve image sensor yield during wafer sawing'2006 6,964,916'Image sensor fabrication method and structure'2005 6,956,253'Color filter with resist material in scribe lines'2005 6,861,207'Method for fabricating microlens with lithographic process'2005 6,531,266'Rework procedure for the microlens element of a CMOS image sensor'2003 6,511,779'Method for fabricating high resolution color filter image array optoelectronic microelectronic fabrication'2003 5,858,861'Reducing nitride residue by changing the nitride film surface property'1999

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1999–2012Patents assigned to TAIWAN SEMICONDUCTOR MFG (13)· patent assignee history

1999–2015Based in Hsinchu, TW· patent location history

2003Based in Tau-Yuan, TW· patent location history

2008Based in Jhubei City, TW· patent location history

2009–2012Based in Shin-Chu, TW· patent location history

2009Based in Hsinchu County, TW· patent location history

2012–2015Patents assigned to WENG FU-TIEN (4)· patent assignee history

2012Patents assigned to CHANG BII-JUNQ (1)· patent assignee history

2014–2015Patents assigned to VISERA TECHNOLOGIES CO LTD (3)· patent assignee history

2015Patents assigned to CHANG BII-CHENG (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
TAIWAN SEMICONDUCTOR MFG	13	1999–2012
WENG FU-TIENself	4	2012–2015
VISERA TECHNOLOGIES CO LTD	3	2014–2015
CHANG BII-CHENG	1	2015
CHANG BII-JUNQ	1	2012

Locations

Location	Patents	Span
Hsinchu, TW	10	1999–2015
Shin-Chu, TW	2	2009–2012
Tau-Yuan, TW	2	2003
Hsinchu County, TW	1	2009
Jhubei City, TW	1	2008