Inventor
Hitoshi Itoh
Inventor
Kanagawa, JP
Overview
Patents· 41 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1017%
C23CCoating metallic material16%
H10DInorganic electric semiconductor devices8%
H04NPictorial communication, e.g. television6%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
H01JElectric discharge tubes or discharge lamps3%
G03GElectrography2%
H01LSemiconductor devices2%
H05HPlasma technique2%
PatentTitleYear
10,401,287Lighting device, and apparatus and system incorporating the lighting device20199,852,892Microwave supply apparatus, plasma processing apparatus, and plasma processing method20179,266,146'Film forming method and processing system'20169,252,000'Microwave waveguide apparatus, plasma processing apparatus and plasma processing method'20168,865,590'Film forming method, pretreatment device, and processing system'20148,765,221'Film forming method and film forming apparatus'20148,724,925'Misalignment detecting apparatus, misalignment detecting method, and computer program product'20148,634,108'Method and apparatus for inspecting image, image forming apparatus, and computer-readable recording medium storing image inspecting program'20148,619,278'Printed matter examination apparatus, printed matter examination method, and printed matter examination system'20138,610,353'Plasma generating apparatus, plasma processing apparatus and plasma processing method'20138,587,844'Image inspecting apparatus, image inspecting method, and image forming apparatus'20138,562,751'Dry cleaning method of substrate processing apparatus'20138,551,565'Film forming method and film forming apparatus'20138,537,421'Image processing apparatus, method, and program product removing show-through from density image using mask image generated from gloss image'20138,354,337'Metal oxide film formation method and apparatus'20138,349,725'Method of manufacturing semiconductor device, semiconductor manufacturing apparatus, and storage medium'20138,314,004'Semiconductor device manufacturing method'20128,268,396'Film forming method and apparatus, and storage medium'20128,247,321'Method of manufacturing semiconductor device, semiconductor device, electronic instrument, semiconductor manufacturing apparatus, and storage medium'20128,242,015'Film forming method and film forming apparatus'20128,124,492'Semiconductor device manufacturing method'20128,119,510'Manufacturing method of semiconductor device'20128,055,084'Image processing device, image compression method, image compression program, and recording medium'20118,029,856'Film formation method and apparatus'20117,809,199'Image processing apparatus'20107,639,880'Compressing a multivalue image with control of memory space requirement'20097,278,595'Particle feed apparatus for jet mill'20076,287,988'Semiconductor device manufacturing method, semiconductor device manufacturing apparatus and semiconductor device'20016,252,272'Semiconductor device, and method of fabricating the same'20016,165,916'Film-forming method and film-forming apparatus'20006,013,575'Method of selectively depositing a metal film'20005,990,007'Method of manufacturing a semiconductor device'19995,620,925'Method of manufacturing semiconductor device using a hagolen plasma treatment step'19975,580,615'Method of forming a conductive film on an insulating region of a substrate'19965,498,306'Method and apparatus for manufacturing ink jet recording head'19965,467,725'Thread spreading apparatus for use in overlock sewing machine'19955,223,455'Method of forming refractory metal film'19935,211,987'Method and apparatus for forming refractory metal films'19934,957,880'Method for producing semiconductor device including a refractory metal pattern'19904,817,558'Thin-film depositing apparatus'19894,144,074'Inorganic coating composition'1979Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1989–2001Patents assigned to TOSHIBA KK (11)· patent assignee history
1989–2017Based in Tokyo, JP· patent location history
1990–1996Based in Mitaka, JP· patent location history
2009–2019Based in Kanagawa, JP· patent location history
2011–2017Patents assigned to TOKYO ELECTRON LTD (17)· patent assignee history
2011–2014Based in Nirasaki, JP· patent location history
2012–2019Patents assigned to ITOH HITOSHI (20)· patent assignee history
2012–2016Patents assigned to MATSUMOTO KENJI (9)· patent assignee history
2012–2014Patents assigned to SATO HIROSHI (8)· patent assignee history
2012–2016Based in Yamanashi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ITOH HITOSHIself | 20 | 2012–2019 |
| TOKYO ELECTRON LTD | 17 | 2011–2017 |
| TOSHIBA KK | 11 | 1989–2001 |
| MATSUMOTO KENJI | 9 | 2012–2016 |
| SATO HIROSHI | 8 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kanagawa, JP | 9 | 2009–2019 |
| Nirasaki, JP | 9 | 2011–2014 |
| Tokyo, JP | 8 | 1989–2017 |
| Yamanashi, JP | 6 | 2012–2016 |
| Mitaka, JP | 4 | 1990–1996 |