Inventor
Zhigang Chen
Inventor
Campbell, CA, US
Overview
Patents· 69 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
H01LSemiconductor devices6%
H05HPlasma technique6%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light4%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds4%
C09DCoating compositions, e.g. paints, varnishes or lacquers4%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices3%
G02BOptical elements, systems or apparatus3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
PatentTitleYear
10,855,056Power and brightness scaling in fiber coupled diode lasers using diodes with optimized beam dimensions202010,833,482Diode laser apparatus with FAC lens out-of-plane beam steering202010,833,474CTE-matched silicon-carbide submount with high thermal conductivity contacts202010,825,656Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring202010,809,612Method of sub resolution assist feature202010,804,129Electrostatic chuck assembly incorporation a gasket for distributing RF power to a ceramic embedded electrode202010,777,968Method, system and apparatus for higher order mode suppression202010,755,895Ion energy control by RF pulse shape202010,741,425Helium plug design to reduce arcing202010,665,435Chamber with vertical support stem for symmetric conductance and RF delivery202010,658,813Low divergence high brightness broad area lasers202010,615,006Symmetric plasma process chamber202010,615,003Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring202010,580,620Symmetric plasma process chamber202010,573,493Inductively coupled plasma apparatus202010,546,728Symmetric plasma process chamber202010,535,502Symmetric plasma process chamber202010,527,930Method of sub resolution assist feature202010,461,505High brightness coherent multi-junction diode lasers201910,460,978Boltless substrate support assembly201910,453,656Symmetric plasma process chamber201910,395,902Chamber with vertical support stem for symmetric conductance and RF delivery201910,392,580Seed oil based reactive diluent201910,381,201Control of etch rate using modeling, feedback and impedance match201910,340,122Systems and methods for tailoring ion energy distribution function by odd harmonic mixing201910,329,377Highly functional epoxidized resins and coatings201910,304,662Multi regime plasma wafer processing to increase directionality of ions201910,283,330Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generators201910,242,847Plasma processing apparatus and liner assembly for tuning electrical skews201910,115,568Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring201810,049,862Chamber with vertical support stem for symmetric conductance and RF delivery201810,026,592Systems and methods for tailoring ion energy distribution function by odd harmonic mixing201810,002,746Multi regime plasma wafer processing to increase directionality of ions201810,002,782ESC assembly including an electrically conductive gasket for uniform RF power delivery therethrough20189,862,141'Selective laser-assisted transfer of discrete components'20189,852,889Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring20179,824,862'Symmetric VHF source for a plasma reactor'20179,825,629'Apparatus comprising a switch feature'20179,741,546'Symmetric plasma process chamber'20179,714,181'Terpolymerized corrosion and scale inhibitor used in circulating cooling water of central air conditioning and its preparation method'20179,714,182'Phosphorus-free corrosion and scale inhibitor used in circulating cooling water of central air conditioning and its preparation method'20179,705,289'High brightness multijunction diode stacking'20179,699,280'Back cover releasing mechanism for mobile device, back cover and mobile device using the same'20179,646,060'Method and server for pushing information proactively'20179,620,334'Control of etch rate using modeling, feedback and impedance match'20179,578,722'Methods for selecting and controlling devices'20179,552,721'System and method for providing wireless control on an electronic device'20179,536,749'Ion energy control by RF pulse shape'20179,385,021'Electronic knob for tuning radial etch non-uniformity at VHF frequencies'20169,373,936'Resonant active grating mirror for surface emitting lasers'20169,204,262'Fountain code-based cooperative multicast method'20159,187,603'Bio-based branched and hyperbranched polymers and oligomers'20159,130,891'Method and apparatus for quickly adding recipient and mobile terminal'20159,096,773'Highly functional epoxidized resins and coatings'20158,982,073'Method and terminal for displaying picture/interface'20158,933,628'Inductively coupled plasma source with phase control'20158,932,429'Electronic knob for tuning radial etch non-uniformity at VHF frequencies'20158,920,597'Symmetric VHF source for a plasma reactor'20148,815,969'Plant oil-based UV-curable coating'20148,704,348'Polyol photosensitizers, carrier gas UV laser ablation sensitizers, and other additives and methods for making and using same'20148,652,297'Symmetric VHF plasma power coupler with active uniformity steering'20148,445,174'Polyol photosensitizers, carrier gas UV laser ablation sensitizers, and other additives and methods for making and using same'20138,313,664'Efficient and accurate method for real-time prediction of the self-bias voltage of a wafer and feedback control of ESC voltage in plasma processing chamber'20128,206,552'RF power delivery system in a semiconductor apparatus'20128,114,567'Polyol photosensitizers, carrier gas UV laser ablation sensitizers, and other additives and methods for making and using same'20128,017,795'Radiation curable polymer films having improved laser ablation properties and radiation curable sensitizers therefor'20117,639,351'Automated process control using optical metrology with a photonic nanojet'20097,394,535'Optical metrology using a photonic nanojet'20086,680,976'Robust, reliable compression and packetization scheme for transmitting video'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2008–2012Based in San Jose, CA, US· patent location history
2011–2019Patents assigned to NDSU RES FOUNDATION (9)· patent assignee history
2012–2017Patents assigned to CHEN ZHIGANG (15)· patent assignee history
2012–2020Patents assigned to APPLIED MATERIALS INC (14)· patent assignee history
2013–2015Based in Dublin, OH, US· patent location history
2014–2020Based in Campbell, CA, US· patent location history
2015–2020Patents assigned to LAM RES CORP (22)· patent assignee history
2015–2019Based in Pleasant Prairie, WI, US· patent location history
2016–2020Patents assigned to NLIGHT INC (8)· patent assignee history
2016–2020Based in Portland, OR, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LAM RES CORP | 22 | 2015–2020 |
| CHEN ZHIGANGself | 15 | 2012–2017 |
| APPLIED MATERIALS INC | 14 | 2012–2020 |
| NDSU RES FOUNDATION | 9 | 2011–2019 |
| NLIGHT INC | 8 | 2016–2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Campbell, California, US | 34 | 2014–2020 |
| Portland, OR, US | 8 | 2016–2020 |
| Dublin, OH, US | 4 | 2013–2015 |
| San Jose, California, US | 4 | 2008–2012 |
| Pleasant Prairie, WI, US | 3 | 2015–2019 |