Inventor
ANGELIQUE D. RALEY
Inventor
US
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices29%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1018%
H01JElectric discharge tubes or discharge lamps6%
PatentTitleYear
12,265,326Method for reducing lithography defects and pattern transfer202511,538,691Gas phase etch with controllable etch selectivity of Si-containing arc or silicon oxynitride to different films or masks202211,380,554Gas phase etching system and method202211,361,993Method for inverse via patterning for back end of line dual damascene structures202211,333,968Method for reducing lithography defects and pattern transfer2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to TOKYO ELECTRON LTD (5)· patent assignee history
2022–2025Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 5 | 2022–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 5 | 2022–2025 |