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Inventor

SHINICHI UMENO

Inventor
JP

Overview

3→
Patents
2021–2025
Patent span
Performing operations
Primary field (CPC B)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Lprimary
H01LSemiconductor devices21%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%
B08BCleaning in general14%
B01DSeparation7%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry7%
B05BSpraying apparatus7%
B05CApparatus for applying fluent materials to surfaces, in general7%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices7%
G05DSystems for controlling or regulating non-electric variables7%
PatentTitleYear
12,424,459Substrate processing apparatus and substrate processing method202511,626,298Liquid supply device and liquid supply method202311,158,525Substrate processing apparatus and substrate processing method2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021–2025Patents assigned to TOKYO ELECTRON LTD (3)· patent assignee history
2021–2025Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD32021–2025
Locations
LocationPatentsSpan
JP32021–2025