Inventor
Frederic Maurer
Inventor
Valhalla, NY, US
Overview
Patents· 10 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H05Kprimary
H05KPrinted circuits26%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1026%
B23KSoldering or unsoldering11%
B33YAdditive manufacturing, i.e. manufacturing of three-dimensional [3d] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3d printing, stereolithography or selective laser sintering11%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
Y10TTechnical subjects covered by former us classification7%
B24BMachines, devices, or processes for grinding or polishing4%
H02NElectric machines not otherwise provided for4%
H10NElectric solid-state devices not otherwise provided for4%
PatentTitleYear
6,708,873'Apparatus and method for filling high aspect ratio via holes in electronic substrates'20046,581,280'Method for filling high aspect ratio via holes in electronic substrates'20036,579,149'Support and alignment device for enabling chemical mechanical polishing rinse and film measurements'20036,527,158'Method and apparatus for forming solder bumps'20036,461,136'Apparatus for filling high aspect ratio via holes in electronic substrates'20026,452,117'Method for filling high aspect ratio via holes in electronic substrates and the resulting holes'20026,394,334'Method and apparatus for forming solder bumps'20026,362,557'Ultrasonic method and actuator for inducing motion of an object'20026,319,093'Chemical-mechanical polishing system and method for integrated spin dry-film thickness measurement'20016,056,191'Method and apparatus for forming solder bumps'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000–2004Patents assigned to IBM (10)· patent assignee history
2000–2004Based in Valhalla, NY, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 10 | 2000–2004 |
Locations
| Location | Patents | Span |
|---|---|---|
| Valhalla, New York, US | 10 | 2000–2004 |