Inventor
Shingo Kawamura
Inventor
Toyama, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material38%
Y10TTechnical subjects covered by former us classification31%
F21VFunctional features or details of lighting devices or systems thereof8%
G06FElectric digital data processing8%
H04MTelephonic communication8%
H05KPrinted circuits8%
PatentTitleYear
9,282,657'Terminal apparatus'20165,663,000'Hard multilayer film formed material of titanium and carbon/silicon'19975,462,775'Method of producing hard multilayer film formed material'19955,368,939'Hard multilayer coated product and process for producing same'19945,260,107'Plasma chemical vapor deposition process for producing a hard multilayer coated product'19935,127,988'Process for the surface treatment of conductive material'1992Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1992–1995Patents assigned to YOSHIDA KOGYO KK (4)· patent assignee history
1992–1993Based in Asahi-mura, JP· patent location history
1994Based in Shimoniikawa-gun, JP· patent location history
1995–1997Based in Toyama, JP· patent location history
1997Patents assigned to YKK CORP (1)· patent assignee history
2016Patents assigned to SONY CORP (1)· patent assignee history
2016Patents assigned to SONY MOBILE COMM AB (1)· patent assignee history
2016Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| YOSHIDA KOGYO KK | 4 | 1992–1995 |
| SONY CORP | 1 | 2016 |
| SONY MOBILE COMM AB | 1 | 2016 |
| YKK CORP | 1 | 1997 |
Locations
| Location | Patents | Span |
|---|---|---|
| Toyama, JP | 2 | 1995–1997 |
| Asahi-mura, JP | 2 | 1992–1993 |
| Tokyo, JP | 1 | 2016 |
| Shimoniikawa-gun, JP | 1 | 1994 |