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Inventor

Kenichi Taniyama

Inventor
Yokohama, JP

Overview

3→
Patents
1998–2000
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
PatentTitleYear
6,051,371'Method for baking photoresist applied on substrate'20006,033,474'Apparatus for baking photoresist applied on substrate'20005,817,178'Apparatus for baking photoresist applied on substrate'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2000Patents assigned to TOSHIBA KK (3)· patent assignee history
1998–2000Based in Yokohama, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOSHIBA KK31998–2000
Locations
LocationPatentsSpan
Yokohama, JP31998–2000