Inventor

Satoshi Hiyoshi

Inventor

Mie, JP

Overview

2002–2019

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C10Mprimary

C10MLubricating compositions21%

C10NIndexing scheme associated with subclass c10m relating to lubricating compositions21%

C07CAcyclic or carbocyclic compounds17%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds10%

C09DCoating compositions, e.g. paints, varnishes or lacquers10%

C07DHeterocyclic compounds3%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds3%

C08LCompositions of macromolecular compounds3%

C09KMaterials for miscellaneous applications, not provided for elsewhere3%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2002–2004Based in Ohtake, JP· patent location history

2005Based in Yokohama, JP· patent location history

2011–2013Based in Yokkaichi, JP· patent location history

2013–2019Patents assigned to KH NEOCHEM CO LTD (5)· patent assignee history

2013–2014Patents assigned to HIYOSHI SATOSHI (4)· patent assignee history

2013–2014Patents assigned to INAYAMA TOSHIHIRO (4)· patent assignee history

2013–2014Patents assigned to AMEMIYA NOBUHITO (3)· patent assignee history

2014Patents assigned to KISHIMOTO SHIGEHISA (2)· patent assignee history

2014Based in Mie, JP· patent location history

2019Based in Tokyo, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations