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Inventor

Hidetoshi Satoh

Inventor
Hachioji, JP

Overview

19→
Patents
1995–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 19 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps35%
B82YSpecific uses or applications of nanostructures30%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices16%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
B60RVehicles, vehicle fittings, or vehicle parts, not otherwise provided for3%
H02GInstallation of electric cables or lines, or of combined optical and electric cables or lines3%
Y10TTechnical subjects covered by former us classification3%
PatentTitleYear
10,821,918Protector and wire harness20206,927,002'Photomask, the manufacturing method, a patterning method, and a semiconductor device manufacturing method'20056,759,666'Method and apparatus for charged particle beam exposure'20046,750,000'Electron device manufacturing method, a pattern forming method, and a photomask used for those methods'20046,703,171'Photomask, the manufacturing method, a patterning method, and a semiconductor device manufacturing method'20046,653,052'Electron device manufacturing method, a pattern forming method, and a photomask used for those methods'20036,583,431'Charged particle beam lithography apparatus for forming pattern on semi-conductor'20036,573,520'Electron beam lithography system'20036,555,833'Charged particle beam lithography apparatus for forming pattern on semi-conductor'20036,509,572'Charged particle beam lithography apparatus for forming pattern on semi-conductor'20036,441,383'Charged particle beam lithography apparatus for forming pattern on semi-conductor'20026,329,665'Charged particle beam lithography apparatus for forming pattern on semi-conductor'20016,320,198'Charged particle beam lithography apparatus for forming pattern on semi-conductor'20016,262,428'Charged particle beam lithography apparatus for forming pattern on semi-conductor'20016,159,644'Method of fabricating semiconductor circuit devices utilizing multiple exposures'20006,121,625'Charged particle beam lithography apparatus for forming pattern on semi-conductor'20005,650,631'Electron beam writing system'19975,520,297'Aperture plate and a method of manufacturing the same'19965,396,077'Electron beam lithography apparatus having electron optics correction system'1995

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1995–2004Patents assigned to HITACHI LTD (16)· patent assignee history
1995–2003Based in Hachioji, JP· patent location history
1996Based in Hachiouji, JP· patent location history
2003–2004Based in Kodaira, JP· patent location history
2004–2005Patents assigned to RENESAS TECH CORP (2)· patent assignee history
2004–2005Based in Hitachinaka, JP· patent location history
2020Patents assigned to YAZAKI CORP (1)· patent assignee history
2020Based in Shizuoka, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI LTD161995–2004
RENESAS TECH CORP22004–2005
YAZAKI CORP12020
Locations
LocationPatentsSpan
Hachioji, JP111995–2003
Kodaira, JP42003–2004
Hitachinaka, JP22004–2005
Shizuoka, JP12020
Hachiouji, JP11996