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Inventor

Tomohiko Sakurai

Inventor
Tokyo, JP

Overview

2→
Patents
2017–2020
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds20%
C09DCoating compositions, e.g. paints, varnishes or lacquers20%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests20%
PatentTitleYear
10,564,546Resist pattern-forming method20209,541,827'Photosensitive composition, cured film and production process thereof, and electronic part'2017

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2017–2020Patents assigned to JSR CORP (2)· patent assignee history
2017–2020Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
JSR CORP22017–2020
Locations
LocationPatentsSpan
Tokyo, JP22017–2020