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Inventor

KOUSUKE OHYAMA

Inventor
JP

Overview

3→
Patents
2025–2026
Patent span
Chemistry
Primary field (CPC C)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%
C07CAcyclic or carbocyclic compounds20%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds20%
C07DHeterocyclic compounds10%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium10%
C09DCoating compositions, e.g. paints, varnishes or lacquers10%
PatentTitleYear
12,554,197Positive resist composition and pattern forming process202612,436,462Positive resist composition and pattern forming process202512,240,804Onium salt, chemically amplified resist composition and patterning process2025

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2025–2026Patents assigned to SHINETSU CHEMICAL CO (3)· patent assignee history
2025–2026Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SHINETSU CHEMICAL CO32025–2026
Locations
LocationPatentsSpan
JP32025–2026