Inventor
RYUTARO SUDA
Inventor
JP
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps30%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%
H01LSemiconductor devices23%
C23CCoating metallic material7%
H05HPlasma technique5%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices2%
H10BElectronic memory devices2%
PatentTitleYear
12,580,154Etching method and plasma processing apparatus202612,560,863Etching method and plasma processing system202612,512,325Etching method and etching apparatus202512,368,027Substrate processing method and substrate processing apparatus202512,347,651Etching method and plasma processing apparatus202512,341,020Substrate processing method and substrate processing apparatus202512,198,938Etching method202512,142,484Etching method202411,996,296Substrate processing method and substrate processing system202411,615,964Etching method202311,600,501Etching method and plasma processing apparatus202311,551,937Etching method202311,482,425Etching method and etching apparatus202211,456,180Etching method202211,361,976Substrate processing method and plasma processing apparatus202211,342,194Substrate processing method and substrate processing apparatus202211,171,012Method and apparatus for formation of protective sidewall layer for bow reduction2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to TOKYO ELECTRON LTD (17)· patent assignee history
2021–2026Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 17 | 2021–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 17 | 2021–2026 |