LexDanaLexDanabeta
Inventor

Benjamin Sigel

Inventor
Aalen, DE

Overview

3→
Patents
2015–2018
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G02Bprimary
G02BOptical elements, systems or apparatus33%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
B81BMicrostructural devices or systems, e.g. micromechanical devices11%
H01LSemiconductor devices11%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1011%
PatentTitleYear
9,964,673Optical system with aperture device having plurality of aperture elements20189,851,555Optical component20179,030,644'Projection exposure apparatus for semiconductor lithography including an actuator system'2015

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2015–2018Patents assigned to ZEISS CARL SMT GMBH (3)· patent assignee history
2015–2018Patents assigned to SIGEL BENJAMIN (2)· patent assignee history
2015Patents assigned to BERTELE ANDREAS (1)· patent assignee history
2015Patents assigned to KLOESCH PETER (1)· patent assignee history
2015–2018Based in Aalen, DE· patent location history
2018Patents assigned to BLEIDISTEL SASCHA (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ZEISS CARL SMT GMBH32015–2018
SIGEL BENJAMINself22015–2018
BERTELE ANDREAS12015
BLEIDISTEL SASCHA12018
KLOESCH PETER12015
Locations
LocationPatentsSpan
Aalen, DE32015–2018