Inventor
James A. Liddle
Inventor
Westfield, NJ, US
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices24%
H01JElectric discharge tubes or discharge lamps24%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests13%
B82YSpecific uses or applications of nanostructures11%
G02BOptical elements, systems or apparatus8%
A62BDevices, apparatus or methods for life-saving3%
PatentTitleYear
9,616,255'Safety restraint anchor system'20177,042,645'Micro-lens array and method of making micro-lens array'20066,906,846'Micro-electro-mechanical system device and method of making same'20056,700,708'Micro-lens array and method of making micro-lens array'20046,528,799'Device and method for suppressing space charge induced aberrations in charged-particle projection lithography systems'20036,492,647'Electron guns for lithography tools'20026,400,090'Electron emitters for lithography tools'20026,232,040'Method of electron beam exposure utilizing emitter with conductive mesh grid'20016,177,218'Lithographic process for device fabrication using electron beam imaging'20016,051,346'Process for fabricating a lithographic mask'20005,985,493'Membrane mask for projection lithography'19995,701,014'Projection lithography apparatus'19975,561,008'Process for device fabrication using projection lithography and an apparatus therefor'19965,500,312'Masks with low stress multilayer films and a process for controlling the stress of multilayer films'19965,316,879'Sub-micron device fabrication using multiple aperture filter'19945,279,925'Projection electron lithographic procedure'19945,260,151'Device manufacture involving step-and-scan delineation'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993–1994Patents assigned to AT & T BELL LAB (3)· patent assignee history
1993–1994Based in Chatham, NJ, US· patent location history
1994–1997Based in Scotch Plains, NJ, US· patent location history
1996–2003Patents assigned to LUCENT TECHNOLOGIES INC (6)· patent assignee history
1999–2003Based in Westfield, NJ, US· patent location history
2001–2005Patents assigned to AGERE SYSTEMS INC (4)· patent assignee history
2002Patents assigned to AGERE SYST GUARDIAN CORP (1)· patent assignee history
2004–2006Patents assigned to TRIQUINT TECHNOLOGY HOLDING CO (2)· patent assignee history
2004–2006Based in Walnut Creek, CA, US· patent location history
2017Based in Omaha, NE, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LUCENT TECHNOLOGIES INC | 6 | 1996–2003 |
| AGERE SYSTEMS INC | 4 | 2001–2005 |
| AT & T BELL LAB | 3 | 1993–1994 |
| TRIQUINT TECHNOLOGY HOLDING CO | 2 | 2004–2006 |
| AGERE SYST GUARDIAN CORP | 1 | 2002 |
Locations
| Location | Patents | Span |
|---|---|---|
| Westfield, New Jersey, US | 7 | 1999–2003 |
| Scotch Plains, New Jersey, US | 4 | 1994–1997 |
| Walnut Creek, California, US | 3 | 2004–2006 |
| Chatham, New Jersey, US | 2 | 1993–1994 |
| Omaha, NE, US | 1 | 2017 |