Inventor
Tadashi Atoji
Inventor
Machida, JP
Overview
Patents· 10 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1025%
Y10TTechnical subjects covered by former us classification11%
H10DInorganic electric semiconductor devices7%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation7%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution7%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
B41JTypewriters4%
C23CCoating metallic material4%
Y02PClimate change mitigation technologies in the production or processing of goods4%
PatentTitleYear
8,029,685'Liquid ejection head and its method of manufacture'20117,642,112'Method of manufacturing bonded substrate stack'20107,245,002'Semiconductor substrate having a stepped profile'20076,417,108'Semiconductor substrate and method of manufacturing the same'20026,156,624'Method for production of SOI substrate by pasting and SOI substrate'20006,103,009'Fabrication process for a SOI substrate'20006,054,363'Method of manufacturing semiconductor article'20005,876,497'Fabrication process and fabrication apparatus of SOI substrate'19995,686,734'Thin film semiconductor device and photoelectric conversion device using the thin film semiconductor device'19975,445,992'Process for forming a silicon carbide film'1995Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1995–2011Patents assigned to CANON KK (10)· patent assignee history
1995–2002Based in Machida, JP· patent location history
2007Based in Tokyo, JP· patent location history
2010–2011Based in Yokohama, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CANON KK | 10 | 1995–2011 |
Locations
| Location | Patents | Span |
|---|---|---|
| Machida, JP | 7 | 1995–2002 |
| Yokohama, JP | 2 | 2010–2011 |
| Tokyo, JP | 1 | 2007 |