Inventor

Katsuya Sugiyama

Inventor

Kashiwa, JP

Overview

20→

Patents

1995–2013

Patent span

Physics

Primary field (CPC G)

Patents· 20 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary

H01JElectric discharge tubes or discharge lamps30%

G01NInvestigating or analysing materials by determining their chemical or physical properties20%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices13%

G06TImage data processing or generation, in general13%

G01RMeasuring electric variables10%

H02BBoards, substations or switching arrangements for the supply or distribution of electric power5%

H02PControl or regulation of electric motors, electric generators or dynamo-electric converters5%

H05HPlasma technique3%

PatentTitleYear

8,604,430'Method and an apparatus of an inspection system using an electron beam'2013 8,134,125'Method and apparatus of an inspection system using an electron beam'2012 7,952,074'Method and apparatus for inspecting integrated circuit pattern'2011 7,439,506'Method and an apparatus of an inspection system using an electron beam'2008 7,417,444'Method and apparatus for inspecting integrated circuit pattern'2008 7,242,015'Patterned wafer inspection method and apparatus therefor'2007 7,232,996'Method and an apparatus of an inspection system using an electron beam'2007 7,026,830'Method and apparatus for inspecting integrated circuit pattern'2006 7,012,252'Method and an apparatus of an inspection system using an electron beam'2006 6,987,265'Method and an apparatus of an inspection system using an electron beam'2006 6,979,823'Patterned wafer inspection method and apparatus therefor'2005 6,797,954'Patterned wafer inspection method and apparatus therefor'2004 6,559,663'Method and apparatus for inspecting integrated circuit pattern'2003 6,512,227'Method and apparatus for inspecting patterns of a semiconductor device with an electron beam'2003 6,452,178'Method and an apparatus of an inspection system using an electron beam'2002 6,348,690'Method and an apparatus of an inspection system using an electron beam'2002 6,329,826'Method and apparatus for inspecting integrated circuit pattern'2001 6,172,363'Method and apparatus for inspecting integrated circuit pattern'2001 5,561,697'Microtron electron accelerator'1996 5,399,873'Microtron electron accelerator'1995

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1995–1996Patents assigned to HITACHI MEDICAL CORP (2)· patent assignee history

1995–1996Based in Hachioji, JP· patent location history

2001–2013Patents assigned to HITACHI LTD (18)· patent assignee history

2001–2013Based in Kashiwa, JP· patent location history

2012–2013Patents assigned to FUKUHARA SATORU (2)· patent assignee history

2012–2013Patents assigned to ICHIHASHI MIKIO (2)· patent assignee history

2012–2013Patents assigned to IWABUCHI YUKO (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
HITACHI LTD	18	2001–2013
FUKUHARA SATORU	2	2012–2013
HITACHI MEDICAL CORP	2	1995–1996
ICHIHASHI MIKIO	2	2012–2013
IWABUCHI YUKO	2	2012–2013

Locations

Location	Patents	Span
Kashiwa, JP	18	2001–2013
Hachioji, JP	2	1995–1996