Inventor

Chi-Tung Huang

Inventor

Hsinchu, TW

Overview

2002–2011

Patent span

Electricity

Primary field (CPC H)

Patents· 16 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Wprimary

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1028%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%

B24BMachines, devices, or processes for grinding or polishing9%

C09GPolishing compositions9%

C23CCoating metallic material9%

H10BElectronic memory devices9%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%

H10DInorganic electric semiconductor devices3%

PatentTitleYear

8,003,519'Systems and methods for back end of line processing of semiconductor circuits'2011 7,553,755'Method for symmetric deposition of metal layer'2009 7,544,618'Two-step chemical mechanical polishing process'2009 7,498,257'Methods for metal ARC layer formation'2009 7,491,621'Method of forming isolation structures in a semiconductor manufacturing process'2009 7,361,601'Chemical mechanical polish process and method for improving accuracy of determining polish endpoint thereof'2008 7,071,102'Method of forming a metal silicide layer on non-planar-topography polysilicon'2006 6,706,626'Method of fabricating contact plug'2004 6,688,969'Method for planarizing a dielectric layer of a flash memory device'2004 6,565,705'Wafer carrier used for chemical mechanic polishing'2003 6,559,490'Method of processing dielectric layer in ferroelectric RAM and structure of the like'2003 6,521,922'Passivation film on a semiconductor wafer'2003 6,514,821'Method for planarizing dielectric layer of flash memory'2003 6,509,249'Method of fabricating shallow trench isolation'2003 6,503,832'Application of controlling gas valves to reduce particles from CVD process'2003 6,407,454'Inter-metal dielectric layer'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002–2011Patents assigned to MACRONIX INT CO LTD (16)· patent assignee history

2002–2011Based in Hsinchu, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
MACRONIX INT CO LTD	16	2002–2011

Locations

Location	Patents	Span
Hsinchu, TW	16	2002–2011