LexDanaLexDanabeta
Inventor

Sachiko Hashimoto

Inventor
Tokyo, JP

Overview

3→
Patents
2004–2007
Patent span
Chemistry
Primary field (CPC C)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material30%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
C01GCompounds containing metals not covered by subclasses c01d or c01f10%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds10%
C07CAcyclic or carbocyclic compounds10%
PatentTitleYear
7,238,822'Ruthenium compound and process for producing a metal ruthenium film'20077,002,033'Chemical vapor deposition material and chemical vapor deposition'20066,806,210'Tantalum oxide film, use thereof, process for forming the same and composition'2004

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004–2007Patents assigned to JSR CORP (3)· patent assignee history
2004–2007Based in Tokyo, JP· patent location history
2006Based in Chuo-ku, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
JSR CORP32004–2007
Locations
LocationPatentsSpan
Tokyo, JP22004–2007
Chuo-ku, JP12006