Inventor
Chiu Chan
Inventor
Foster City, CA, US
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1026%
C23CCoating metallic material24%
H01JElectric discharge tubes or discharge lamps13%
H01LSemiconductor devices11%
B24BMachines, devices, or processes for grinding or polishing5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry3%
C02FTreatment of water, waste water, sewage, or sludge3%
C09KMaterials for miscellaneous applications, not provided for elsewhere3%
C30BSingle-crystal growth3%
PatentTitleYear
10,227,695Shadow ring for modifying wafer edge and bevel deposition20199,873,105Sorbent material and a method for enhancing sorption performance thereof20189,653,327'Methods of removing a material layer from a substrate using water vapor treatment'20179,337,072'Apparatus and method for substrate clamping in a plasma chamber'20168,993,454'Ultra high selectivity doped amorphous carbon strippable hardmask development and integration'20158,536,065'Ultra high selectivity doped amorphous carbon strippable hardmask development and integration'20138,513,129'Planarizing etch hardmask to increase pattern density and aspect ratio'20138,361,906'Ultra high selectivity ashable hard mask film'20138,282,734'Methods to improve the in-film defectivity of PECVD amorphous carbon films'20128,197,636'Systems for plasma enhanced chemical vapor deposition and bevel edge etching'20127,922,440'Apparatus and method for centering a substrate in a process chamber'20117,867,578'Method for depositing an amorphous carbon film with improved density and step coverage'20117,514,125'Methods to improve the in-film defectivity of PECVD amorphous carbon films'20097,048,607'System and method for chemical mechanical planarization'20066,468,136'Tungsten CMP with improved alignment mark integrity, reduced edge residue, and reduced retainer ring notching'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2019Patents assigned to APPLIED MATERIALS INC (14)· patent assignee history
2002–2019Based in Foster City, CA, US· patent location history
2012–2019Patents assigned to CHAN CHIU (8)· patent assignee history
2012–2017Patents assigned to RATHI SUDHA (6)· patent assignee history
2012–2019Patents assigned to BALASUBRAMANIAN GANESH (4)· patent assignee history
2013–2017Patents assigned to LEE KWANGDUK DOUGLAS (4)· patent assignee history
2018Based in Kowloon, HK· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 14 | 2002–2019 |
| CHAN CHIUself | 8 | 2012–2019 |
| RATHI SUDHA | 6 | 2012–2017 |
| BALASUBRAMANIAN GANESH | 4 | 2012–2019 |
| LEE KWANGDUK DOUGLAS | 4 | 2013–2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Foster City, California, US | 14 | 2002–2019 |
| Kowloon, HK | 1 | 2018 |