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Inventor

Satoshi Fujimura

Inventor
Kawasaki, JP

Overview

44→
Patents
1987–2014
Patent span
Physics
Primary field (CPC G)

Patents· 44 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices28%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests28%
G10LSpeech analysis techniques or speech synthesis10%
G01RMeasuring electric variables7%
H04MTelephonic communication6%
G06FElectric digital data processing5%
H04NPictorial communication, e.g. television5%
A63FCard, board, or roulette games1%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry1%
B82YSpecific uses or applications of nanostructures1%
PatentTitleYear
8,728,431'Method of preparing carbon nanotubes and catalyst for producing carbon nanotubes'20148,525,458'Brushless motor position detection device'20138,316,395'Information processing apparatus and method, and program'20128,293,449'Positive resist composition and method of forming resist pattern'20128,213,764'Information processing apparatus, method and program'20128,198,004'Resist composition'20127,763,412'Polymer, positive resist composition and method for forming resist pattern'20107,676,368'Information processing apparatus and method, recording medium, and program for converting text data to audio data'20107,544,460'Resist composition, multilayer body, and method for forming resist pattern'20097,541,138'Resist composition'20097,527,909'Resist composition'20097,501,220'Resist composition'20097,501,221'Positive type resist composition and resist pattern formation method using same'20097,435,530'Positive type resist composition and resist pattern formation method using same'20087,390,612'Positive type resist composition and resist pattern formation method using same'20087,326,515'Positive type resist composition and resist pattern formation method using same'20087,323,287'Positive type resist composition and resist pattern formation method using same'20087,316,888'Positive type resist composition and resist pattern formation method using same'20087,316,889'Positive type resist composition and resist pattern formation method using same'20087,305,342'Text-to-speech synthesis system and associated method of associating content information'20077,183,368'Negative-working photoresist composition'20077,099,920'Method and system for creating an e-mail by automatically constituting a text and an attached file of the e-mail basing on at least one words or sentences and picture stored in a single picture file'20067,074,543'Positive resist composition and method of forming resist pattern from the same'20067,047,199'Communication apparatus, communication method and program storage medium'20067,035,806'Communication apparatus, communication method and program storage medium'20066,996,530'Information processing apparatus, information processing method, recording medium, and program'20066,982,140'Positive resist composition and method of forming resist pattern'20066,897,012'Negative-working photoresist composition'20056,892,349'Information processing apparatus, method and program for displaying one or more characters on a plurality of application display areas responsive to scenario information'20056,879,958'Communication apparatus, communication method and program storage medium'20056,792,406'Information processing apparatus, portable device, electronic pet apparatus recording medium storing information processing procedures and information processing method'20046,759,176'Positive-working resist composition'20046,757,657'Information processing apparatus, information processing method and program storage medium'20046,749,991'Negative-working photoresist composition'20046,749,989'Positive-working photoresist composition'20046,444,397'Negative-working photoresist composition'20026,171,749'Negative-working chemical-amplification photoresist composition'20016,055,536'Information processing apparatus and information processing method'20004,728,891'Nuclear magnetic resonance imaging method'19884,728,894'High frequency coil for an NMR apparatus'19884,725,780'RF field generator and detector'19884,706,028'NMR imaging method'19874,700,137'High-frequency magnetic field generator/detector'19874,649,345'NMR imaging method'1987

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1987–2013Patents assigned to MITSUBISHI ELECTRIC CORP (7)· patent assignee history
1987Based in Hyogo, JP· patent location history
2000–2012Patents assigned to SONY CORP (13)· patent assignee history
2000–2013Based in Tokyo, JP· patent location history
2001–2014Patents assigned to TOKYO OHKA KOGYO CO LTD (23)· patent assignee history
2001–2014Based in Kanagawa, JP· patent location history
2002–2007Based in Chigasaki, JP· patent location history
2006–2012Based in Kawasaki, JP· patent location history
2012–2014Patents assigned to FUJIMURA SATOSHI (6)· patent assignee history
2012Patents assigned to HADA HIDEO (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO OHKA KOGYO CO LTD232001–2014
SONY CORP132000–2012
MITSUBISHI ELECTRIC CORP71987–2013
FUJIMURA SATOSHIself62012–2014
HADA HIDEO22012
Locations
LocationPatentsSpan
Kawasaki, JP162006–2012
Kanagawa, JP142001–2014
Chigasaki, JP62002–2007
Hyogo, JP31987
Tokyo, JP22000–2013