Inventor
Kohichi Tanaka
Inventor
Osaka, JP
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices13%
H10KOrganic electric solid-state devices11%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution10%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
B24BMachines, devices, or processes for grinding or polishing8%
Y02PClimate change mitigation technologies in the production or processing of goods8%
H05BElectric heating6%
G09FDisplaying5%
H10DInorganic electric semiconductor devices4%
B65HHandling thin or filamentary material, e.g. sheets, webs, cables3%
PatentTitleYear
10,847,758Method for releasing resin film and method for manufacturing organic EL display device202010,749,126Method for manufacturing flexible electronic device202010,710,200Method for producing device support base and laser cleaning apparatus202010,625,443Method and device for releasing resin film, method for manufacturing electronic device, and method for manufacturing organic EL display device202010,607,513Method and apparatus for producing flexible OLED device202010,581,027Method and apparatus for producing flexible OLED device202010,516,121Apparatus for producing flexible display201910,516,001Method and apparatus for producing flexible OLED device201910,505,155Method and apparatus for producing flexible OLED device201910,497,887Method and apparatus for producing flexible OLED device20198,717,340'Thin film transistor, method for manufacturing same, and display apparatus'20147,642,399'Mouse with deficiency of glutamate transporter GLAST function'20105,972,536'Negative electrode material for non-aqueous liquid electrolyte secondary cell, method for producing same and non-aqueous liquid electrolyte secondary cell employing same'19995,834,138'Negative electrode material for non-aqueous liquid electrolyte secondary cell and non-aqueous liquid electrolyte secondary cell employing same'19985,718,620'Polishing machine and method of dissipating heat therefrom'19985,549,502'Polishing apparatus'19965,400,547'Polishing machine and method of dissipating heat therefrom'19955,335,457'Method of chucking semiconductor wafers'19945,226,758'Method and an apparatus for handling wafers'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993–1998Patents assigned to SHINETSU HANDOTAI KK (5)· patent assignee history
1993–1998Based in Fukushima, JP· patent location history
1996Patents assigned to FUJIKOSHI MACHINERY CORP (1)· patent assignee history
1996Based in Yawara-mura, JP· patent location history
1998–1999Patents assigned to SONY CORP (2)· patent assignee history
1998–2010Based in Kanagawa, JP· patent location history
2014–2020Based in Osaka, JP· patent location history
2019–2020Patents assigned to SAKAI DISPLAY PRODUCTS CORP (7)· patent assignee history
2019Based in Sakai, JP· patent location history
2020Patents assigned to HON HAI PREC IND CO LTD (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAKAI DISPLAY PRODUCTS CORP | 7 | 2019–2020 |
| SHINETSU HANDOTAI KK | 5 | 1993–1998 |
| HON HAI PREC IND CO LTD | 3 | 2020 |
| SONY CORP | 2 | 1998–1999 |
| FUJIKOSHI MACHINERY CORP | 1 | 1996 |
Locations
| Location | Patents | Span |
|---|---|---|
| Osaka, JP | 10 | 2014–2020 |
| Kanagawa, JP | 3 | 1998–2010 |
| Fukushima, JP | 3 | 1993–1998 |
| Sakai, JP | 1 | 2019 |
| Yawara-mura, JP | 1 | 1996 |