Inventor
Timothy G. Adams
Inventor
Sudbury, MA, US
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices43%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests16%
Y10TTechnical subjects covered by former us classification8%
B81BMicrostructural devices or systems, e.g. micromechanical devices5%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems5%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
C07CAcyclic or carbocyclic compounds3%
C07DHeterocyclic compounds3%
C09DCoating compositions, e.g. paints, varnishes or lacquers3%
PatentTitleYear
7,723,850'Electronic devices having air gaps'20107,632,630'Dyed photoresists and methods and articles of manufacture comprising same'20097,256,127'Air gap formation'20077,183,037'Antireflective coatings with increased etch rates'20077,147,983'Dyed photoresists and methods and articles of manufacture comprising same'20067,018,678'Electronic device manufacture'20066,989,224'Polymers with mixed photoacid-labile groups and photoresists comprising same'20066,855,466'Planarizing antireflective coating compositions'20056,828,083'Photoresist compositions and use of same'20046,653,049'High conformality antireflective coating compositions'20036,602,652'Antireflective coating compositions and exposure methods under 200 nm'20036,410,209'Methods utilizing antireflective coating compositions with exposure under 200 nm'20026,316,165'Planarizing antireflective coating compositions'20016,190,839'High conformality antireflective coating compositions'20016,033,830'Antireflective coating compositions'20005,886,102'Antireflective coating compositions'19995,731,364'Photoimageable compositions comprising multiple arylsulfonium photoactive compounds'19985,719,003'Method for increasing the differential solubility of an imaged photoresist through hydroxy group blocking via reaction with vinyl ethers'19985,641,604'Photoresist composition with improved differential solubility through hydroxyl group blocking via reaction with vinyl ethers'19974,857,227'Liquid crystal mixtures having widened smectic temperature range'1989Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1989Patents assigned to POLAROID CORP (1)· patent assignee history
1989Based in Allston, MA, US· patent location history
1997–2007Patents assigned to SHIPLEY CO LLC (17)· patent assignee history
1997–2010Based in Sudbury, MA, US· patent location history
2009–2010Patents assigned to ROHM & HAAS ELECT MAT (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHIPLEY CO LLC | 17 | 1997–2007 |
| ROHM & HAAS ELECT MAT | 2 | 2009–2010 |
| POLAROID CORP | 1 | 1989 |
Locations
| Location | Patents | Span |
|---|---|---|
| Sudbury, Massachusetts, US | 19 | 1997–2010 |
| Allston, Massachusetts, US | 1 | 1989 |