Inventor
Michiya Kawakami
Inventor
Tokyo, JP
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C01Bprimary
C01BNon-metallic elements33%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests13%
B01DSeparation7%
B08BCleaning in general7%
C02FTreatment of water, waste water, sewage, or sludge7%
PatentTitleYear
5,399,334'Process for producing hydrogen peroxide'19955,378,450'Process for producing hydrogen peroxide'19955,326,035'High purity cleaning system'19945,320,821'Method for producing hydrogen peroxide'19945,302,311'Cleaning solution of semiconductor substrate'19945,292,496'Process for the preparation of hydrogen peroxide'19945,160,429'Piping system for supplying ultra-pure water'1992Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1992–1994Patents assigned to OHMI TADAHIRO (2)· patent assignee history
1992Based in Sendai, JP· patent location history
1994–1995Patents assigned to MITSUBISHI GAS CHEMICAL CO (5)· patent assignee history
1994–1995Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MITSUBISHI GAS CHEMICAL CO | 5 | 1994–1995 |
| OHMI TADAHIRO | 2 | 1992–1994 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 6 | 1994–1995 |
| Sendai, JP | 1 | 1992 |